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A New AFM-Based Lithography Method: Thermochemical Nanolithography

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Scanning Probe Microscopy in Nanoscience and Nanotechnology

Part of the book series: NanoScience and Technology ((NANO))

Abstract

In the last decade, there has been a tremendous increase in the number of techniques for patterning materials on the nanoscale (10-100nm), driven by numerous potential applications, for example, in sensing[1], data storage [2], optoelectronic [3], display [4], nanofluidic [5], and biomimetic [6] devices. An ideal nanolithography technique would be able to: (1) write with nm resolution; (2) write with speeds of multiple centimeters per second (while preserving nanometer scale registry) for wafer-scale lithography; (2) impart different chemical functionality and/or physical properties (with or without topographical changes) as desired; (4) function in different laboratory environments (for example, under ambient pressure or in solution); (5) be capable of massive parallelization for both writing and metrology; and (6) write on a variety of materials deposited on a variety of substrates. Specific applications will require one or more of the attributes described earlier, but the most versatile technique would encompass as many as possible. To our knowledge, no technique currently in practice can simultaneously attain all of these features.

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Author information

Authors and Affiliations

  1. School of Physics Georgia Institute of Technology, 837 State Street, Atlanta, GA, 30332-0430, USA

    Debin Wang, Vamsi Kodali, Jennifer Curtis & Elisa Riedo

  2. Department of Physics, Kansas State University, Manhattan, KS, 66506-2601, USA

    Robert Szoszkiewicz

  3. School of Chemistry and Biochemistry Georgia Institute of Technology, 901 Atlantic Drive NW 30332-0400, Atlanta, GA, 30332-0430, USA

    Seth Marder

Authors
  1. Debin Wang
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  2. Robert Szoszkiewicz
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  3. Vamsi Kodali
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  4. Jennifer Curtis
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  5. Seth Marder
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  6. Elisa Riedo
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Corresponding author

Correspondence to Debin Wang .

Editor information

Editors and Affiliations

  1. Nanoprobe Lab. Bio- & Nanotechnology &, Ohio State University, West 19th Avenue 201, Columbus, 43210-1142, U.S.A.

    Bharat Bhushan

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Wang, D., Szoszkiewicz, R., Kodali, V., Curtis, J., Marder, S., Riedo, E. (2010). A New AFM-Based Lithography Method: Thermochemical Nanolithography. In: Bhushan, B. (eds) Scanning Probe Microscopy in Nanoscience and Nanotechnology. NanoScience and Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-03535-7_22

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