Abstract
The energy of the laser radiation that is applied to the workpiece during laser material processing has to be transformed effectively into usable process energy. The normal light absorptivity at those wavelengths for which high-power lasers are available today is quite low in case of dielectrics and in case of metals its value lies in the 10–40% region.1 When exceeding a critical intensity in general an increase of the absorptivity can be observed [12, 14]. Figure 9.1 shows this behavior in case of processing Cu using a pulsed Nd:YAG laser. At small intensities the reflectivity corresponds to the normal reflectivity, after exceeding the critical value of the intensity the reflectivity decreases to a value of almost zero. The decrease of the reflectivity is accompanied by an increase of the energy coupling into the workpiece.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
Reference
G. Bekefi, Radiation Processes in Plasmas, Wiley, New York, 1966
E. Beyer, K. Behler, U. Petschke, and W. Sokolowski, Schweißen mit CO2-Lasern, Laser und Optoelektronik, Vol. 18, pp. 35–46, 1986
P. Cavaliere, G. Ferrante, and C. Leone, Particle-atom ionising collisions in the presence of a laser radiation field, J. Phys. B, Vol. 13, p. 4495, 1980
H.W. Drawin and P. Felenbok, Data for Plasmas in Local Thermodynamic Equilibrium, Gauthier-Villars, Paris, 1965
W. Ebeling, W.D. Kraeft, and D. Kremp, Theory of Bound States and Ionization Equilibrium in Plasmas and Solids, Akademie-Verlag, Berlin, 1976
H.R. Griem, Plasma Spectroscopy, Mc-Graw-Hill, 1964
K. Günther, S. Lang, and R. Radtke, Electrical conductivity and charge carrier screening in weakly non-ideal plasmas, J. Phys. D: Appl. Phys., Vol. 16, p. 1235, 1983
K. Günther and R. Radtke, Electrical Properties of Weakly Nonideal Plasmas, Birkhäuser, Basel, 1984
T. Holstein, Low Frequency Approximation to Free-Free Transition Probabilities, Pittsburgh, 1965
S. Ichimaru, Basic Principles of Plasma Physics, Benjamin/Cummings Publishing Company, London, 1973
J. D. Jackson, Classical Electrodynamics, John Wiley & Sons, New York, 1975
E. Kocher and others, Dynamics of Laser Processing in Transparent Media, IEEE J-QE-8, 1972
A. Matsunawa, Beam – Plasma Interaction in Laser Materials Processing by Different Wavelength, 10.ter Internationaler Kongress LASER 91, 1991
W. Peschko, Abtragung fester Targets durch Laserstrahlung, 1981
A.N. Pirri, Plasma Energy Transfer to Metal Surfaces Irradiated by Pulsed Lasers, IAAJ., 16, 1979
Yu. P. Raizer, Laser-Induced Discharge Phenomena, Consultants Bureau, New York, 1977
F. Reif, Fundamentals of Statistical and Thermal Physics, McGraw Hill, 1965
E. Beyer, Eunfluss des laserindizierten Plasmas beim Schweissen mit CO2-Lasern, Dissertation, TH Darmstadt, 1985
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2011 Springer-Verlag Berlin Heidelberg
About this chapter
Cite this chapter
Wester, R. (2011). Plasma Physics. In: Poprawe, R. (eds) Tailored Light 2. RWTHedition. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-01237-2_9
Download citation
DOI: https://doi.org/10.1007/978-3-642-01237-2_9
Published:
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-01236-5
Online ISBN: 978-3-642-01237-2
eBook Packages: EngineeringEngineering (R0)