Numerous physical models have been developed in order to describe the physical and chemical processes constituting the optical microlithography process. Many of these models depend on parameters that have to be calibrated against experimental data. An optimization routine using a genetic algorithm (GA) proved a feasible approach in order to find adequate model parameters. However, the high computation time and the need for a better reproducibility of the results suggest improvements of this approach. In this chapter we show that the application of the proposed memetic algorithm (MA) to the calibration of photoresist parameters is suited to improve both the convergence behavior and the reproducibility of results. As a GA is a model of Darwinian natural evolution, so can an MA be qualified as a model of cultural evolution. An MA can be characterized as a combination of interactive and individual search of a given population. From this general model, a variety of implementations can be derived. In this chapter, we will present a hybrid MA employing a GA and a method from the field of mathematical constrained optimization, the sequential quadratic programming (SQP) algorithm.
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Dür, C., Fühner, T., Tollkühn, B., Erdmann, A., Kókai, G. (2007). Memetic Algorithms Parametric Optimization for Microlithography. In: Abraham, A., Grosan, C., Ishibuchi, H. (eds) Hybrid Evolutionary Algorithms. Studies in Computational Intelligence, vol 75. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-73297-6_9
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