Titanium Dioxide MOCVD Coating on CoCr Alloy and its Properties in Compare with Phosphate Coatings
Titanium oxide thin films were processed by MOCVD method. The films were deposited on CoCr alloy substrat using a low pressure reactor. Two temperatures (400°C and 500°C), 2 pressures (1 and 20 torr) and variable molecular fraction of the precursor it is from 76 to 5000 were used in MOCVD coating procedures. The surfaces were characterized using electronic scanning microscopy (SEM), X-rays analysis (XRD), contact angle and roughness measurements. The corrosion test was cyclic voltametry and was performed in artificial saliva as testing solution.
KeywordsCoCr alloy TiO2 MOCVD phosphate deposition surface analysis electrochemical stability
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