Abstract
In DSAL, contacts (or vias) are patterned in two steps. A GP that surrounds a group of nearby contacts forms on a wafer through optical lithography; member contacts then form through DSA process that arises within a GP. Final contact shape can be predicted by two sequential simulations: lithography simulation to predict GP shape and DSA simulation to predict contact. In reality, the two simulations should be repeated to account for lithography as well as DSA variations.
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Shim, S., Shin, Y. (2018). DSAL Manufacturability. In: Physical Design and Mask Synthesis for Directed Self-Assembly Lithography. NanoScience and Technology. Springer, Cham. https://doi.org/10.1007/978-3-319-76294-4_2
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DOI: https://doi.org/10.1007/978-3-319-76294-4_2
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