Skip to main content
SpringerLink
Log in

Coherent Lithography with Tabletop Soft X-Ray Lasers: Latest Achievements and Prospects

  • Conference paper
  • First Online:
X-Ray Lasers 2016 (ICXRL 2016)

Part of the book series: Springer Proceedings in Physics ((SPPHY,volume 202))

Included in the following conference series:

  • 1140 Accesses

Abstract

We present the latest results in the development of a Talbot lithography technique utilizing tabletop SXR lasers. The main characteristics of the method are reviewed and a hybrid scheme that combines interferometric lithography with Talbot lithography is presented. This approach that we named Talbot Interference Lithography allows overcoming resolution limitations typical of the classical Talbot imaging.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Log in via an institution
Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 169.00
Price excludes VAT (USA)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 219.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info
Hardcover Book
USD 219.99
Price excludes VAT (USA)
  • Durable hardcover edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

References

  1. Langner, A., Solak, H.H., Gronheid, R., van Setten, E., Auzelyte, V., Ekinci Y., Schenau, K.V., Feenstra, K.: Measuring resist-induced contrast loss using EUV interference lithography. Extreme Ultrav. (Euv) Lithogr. 7636, 76362x (2010)

    Google Scholar 

  2. Solak, H.H., David, C.: Patterning of circular structure arrays with interference lithography. J. Vac. Sci. Technol. B 21, 2883–2887 (2003)

    Article  Google Scholar 

  3. Solak, H.H., He, D., Li, W., Singh-Gasson, S., Cerrina, F., Sohn, B.H., Yang, X.M., Nealey, P.: Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography. Appl. Phys. Lett. 75, 2328–2330 (1999)

    Article  ADS  Google Scholar 

  4. Wachulak, P.W., Capeluto, M.G., Menoni, C.S., Rocca, J.J., Marconi, M.C.: Nanopatterning in a compact setup using table top extreme ultraviolet lasers. Opto-Electron. Rev. 16, 444–450 (2008)

    Article  ADS  Google Scholar 

  5. Wachulak, P.W., Urbanski, L., Capeluto, M.G., Hill, D., Rockward, W.S., Iemmi, C., Anderson, E.H., Menoni, C.S., Rocca, J.J., Marconi, M.C.: New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers. J. Micro-Nanolithogr. MEMS MOEMS 8, 021206 (2009)

    Article  Google Scholar 

  6. Isoyan, A., Jiang, F., Cheng, Y.C., Cerrina, F., Wachulak, P., Urbanski, L., Rocca, J., Menoni, C., Marconi, M.: Talbot lithography: self-imaging of complex structures. J. Vac. Sci. Technol. B 27, 2931–2937 (2009)

    Article  Google Scholar 

  7. Li, W., Urbanski, L., Marconi, M.C.: Invited article: progress in coherent lithography using table-top extreme ultraviolet lasers. Rev. Sci. Instrum. 86, 121301 (2015)

    Article  ADS  Google Scholar 

  8. Urbanski, L., Isoyan, A., Stein, A., Rocca, J.J., Menoni, C.S., Marconi, M.C.: Defect-tolerant extreme ultraviolet nanoscale printing. Opt. Lett. 37, 3633–3635 (2012)

    Article  ADS  Google Scholar 

  9. Kim, H., Li, W., Danylyuk, S., Brocklesby, W.S., Marconi, M.C., Juschkin, L.: Optical properties of 2D fractional Talbot patterns under coherent EUV illumination. J. Phys. D-Appl. Phys. 48, 375101 (2015)

    Article  Google Scholar 

  10. Kim, H.S., Li, W., Danylyuk, S., Brocklesby, W.S., Marconi, M.C., Juschkin, L.: Fractional Talbot lithography with extreme ultraviolet light. Opt. Lett. 39, 6969–6972 (2014)

    Article  ADS  Google Scholar 

  11. Li, W., Marconi, M.C.: Extreme ultraviolet talbot interference lithography. Opt. Express (2015) (Submitted)

    Google Scholar 

  12. Liu, Y., Seminario, M., Tomasel, F.G., Chang, C., Rocca, J.J., Attwood, D.T.: Achievement of essentially full spatial coherence in a high-average-power soft-X-ray laser. Phys. Rev. A 63, 033802 (2001)

    Article  ADS  Google Scholar 

  13. Macchietto, C.D., Benware, B.R., Rocca, J.J.: Generation of millijoule-level soft-X-ray laser pulses at a 4-Hz repetition rate in a highly saturated tabletop capillary discharge amplifier. Opt. Lett. 24, 1115–1117 (1999)

    Article  ADS  Google Scholar 

  14. Urbanski, L., Marconi, M.C., Meng, L.M., Berrill, M., Guilbaud, O., Klisnick, A., Rocca, J.J.: Spectral linewidth of a Ne-like Ar capillary discharge soft-X-ray laser and its dependence on amplification beyond gain saturation. Phys. Rev. A 85, 033837 (2012)

    Article  ADS  Google Scholar 

Download references

Acknowledgements

We acknowledge the support from the National Science Foundation through award ECCS 1507907.

Author information

Authors and Affiliations

  1. Engineering Research Center for EUV Science and Technology and Electrical and Computer Engineering Department, Colorado State University, Fort Collins, CO, 80523, USA

    M. C. Marconi, W. Li, C. Kyaw, C. S. Menoni & J. J. Rocca

  2. Department of Physics, Morehouse College, Atlanta, GA, 30314, USA

    W. Rockward

Authors
  1. M. C. Marconi
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. W. Li
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. C. Kyaw
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. W. Rockward
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. C. S. Menoni
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. J. J. Rocca
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to M. C. Marconi .

Editor information

Editors and Affiliations

  1. Kansai Photon Science Institute, National Institutes for Quantum and Radiological Science and Technology, Kyoto, Japan

    Tetsuya Kawachi

  2. Kansai Photon Science Institute, National Institutes for Quantum and Radiological Science and Technology, Kyoto, Japan

    Sergei V. Bulanov

  3. Naraha Remote Technology Development Center, Japan Atomic Energy Agency, Fukushima, Japan

    Hiroyuki Daido

  4. Graduate School for Creation of New Photonics Industries, Shizuoka, Japan

    Yoshiaki Kato

Rights and permissions

Reprints and permissions

Copyright information

© 2018 Springer International Publishing AG

About this paper

Check for updates. Verify currency and authenticity via CrossMark

Cite this paper

Marconi, M.C., Li, W., Kyaw, C., Rockward, W., Menoni, C.S., Rocca, J.J. (2018). Coherent Lithography with Tabletop Soft X-Ray Lasers: Latest Achievements and Prospects. In: Kawachi, T., Bulanov, S., Daido, H., Kato, Y. (eds) X-Ray Lasers 2016. ICXRL 2016. Springer Proceedings in Physics, vol 202. Springer, Cham. https://doi.org/10.1007/978-3-319-73025-7_53

Download citation

Publish with us

Policies and ethics

Search

Navigation