Abstract
Magnesium has been recently becoming an increasingly popular material for various applications. However, excessive chemical reactivity, and oxidation rate in particular, is a major obstruction on the way of Mg to become widely adopted. A significant problem causing the lack of Mg reactivity control is insufficient understanding of mechanisms involved in the oxidation of magnesium surface.
Herewith we present the investigation of atomic-level mechanisms of oxidation initiation and propagation in pure Mg. Namely, X-ray photoelectron spectroscopy at synchrotron Elettra was used as a surface sensitive direct method to determine the valence of Mg and O and the valence band states at the early stage of oxide formation over a principal, most densely packed, crystallographic plane (0001) in pure Mg. The mechanisms of oxygen adsorption on magnesium free surface followed by oxidation (i.e. initiation and kinetics of MgO formation) are clarified.
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© 2016 TMS (The Minerals, Metals & Materials Society)
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Gardonio, S., Fanetti, M., Valant, M., Orlov, D. (2016). Atomic-Level Mechanisms of Magnesium Oxidation. In: Singh, A., Solanki, K., Manuel, M.V., Neelameggham, N.R. (eds) Magnesium Technology 2016. Springer, Cham. https://doi.org/10.1007/978-3-319-48114-2_16
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DOI: https://doi.org/10.1007/978-3-319-48114-2_16
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-48620-8
Online ISBN: 978-3-319-48114-2
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