Synthesis of Nanostructure Carbon Thin Films by Microwave Plasma-Enhanced Chemical Vapor Deposition

  • Ahmed S. WasfiEmail author
  • Hammad R. Humud
  • Mohammed E. Ismael
Conference paper
Part of the Springer Proceedings in Physics book series (SPPHY, volume 186)


In this work, hydrogenated amorphous carbon (a-C:H) thin films were prepared from methane gas using microwave plasma enhanced chemical vapor deposition (MPECVD). The microwave plasma system was built in our laboratory with maximum attained plasma electron temperature and density of (0.65 eV) and (1.45 × 1018 cm−3), respectively. The effect of argon/methane mixing ratio on the optical and structural properties of the films were investigated. X-ray diffraction results indicated a broad peak ranging from 15 to 35 in 2θ angle confirm the amorphous nature of the deposited carbon films. While, FTIR measurements revealed the existence of (a-C:H) through its absorption peak. AFM was used to study the morphological characteristics and to monitor the nanostructure under the influence of different mixing ratios of argon with methane. The distribution of granularity ranged from 30 to 140 nm, and the particles average diameter were 94.39–81.92 nm, also the root mean square roughness was increased with the increasing of the argon/methane mixing ratio. The optical energy gap (Eg) decreased from 2.76 to 2.40 eV with increasing deposition pressure from 0.5 to 1.5 mbar and varying the argon/methane mixing ratio.


Nanostructure amorphous carbon thin films Microwave plasma Chemical vapor deposition 


  1. 1.
    Lebedev, Y.: Microwave discharges: generation and diagnostics. J. Phys. Conf. Ser. 257, 012016 (2010).
  2. 2.
    Hinkov, I., Farhat, S., Lungu, C., Gicquel, A., Silva, F., Mesbahi, A., Brinza, O., Porosnicu, C., Anghel, A.: Microwave plasma enhanced chemical vapor deposition of carbon nanotubes. J. Surf. Eng. Mater. Adv. Technol. 4(4), 196–209 (2014). doi: 10.4236/jsemat.2014.44023 Google Scholar
  3. 3.
    Tachibana, K., Nishida, M., Harima, H., Urano, Y.: Diagnostics and modelling of a methane plasma used in the chemical vapour deposition of amorphous carbon films. J. Phys. D Appl. Phys. 17(8), 1727–1742 (1984)ADSCrossRefGoogle Scholar
  4. 4.
    Mutsukura, N., lnoue, S., Machi, Y.: Deposition mechanism of hydrogenated hard-carbon films in a CH4 discharge plasma. J. Appl. Phys. 72(43), 43–53 (1992)Google Scholar
  5. 5.
    Adhikari, S., Kayastha, M., Ghimire, D., Aryal, H., Adhikary, S., Takeuchi, T., Murakami, K., Kawashimo, Y., Uchida, H., Umeno, M.: Improved photovoltaic properties of heterojunction carbon based solar cell. J. Surf. Eng. Mater. Adv. Technol. 3, 178–183 (2013). doi: 10.4236/jsemat.2013.33024 Google Scholar
  6. 6.
    Wasfi, A.S., Humud, H.R., Ismael, M.E.: Spectroscopic measurements of the electron temperature in low pressure microwave 2.45 GHz argon plasma. Iraqi J. Phys. 13(27), 23–34 (2015)Google Scholar
  7. 7.
    Cicala, G., Bruno, P., Losacco, A.: PECVD of hydrogenated diamond like carbon films from CH4-Ar mixtures: growth chemistry and material characteristics. Diam. Relat. Mater. 13, 1361–1365 (2004)Google Scholar
  8. 8.
    Lazar, G., Zellama, K., Vascan, I., Rusu, I.: Infrared absorption properties of amorphous carbon films. J. Optoelectron. Adv. Mater. 7(2), 647–652 (2005)Google Scholar
  9. 9.
    Silva, S., Forrest, R., Burden, A., Anguita, J., Shannon, J., Sealy, B., Okano, K.: Amorphous carbon: state of the art. In: Proceeding of the 1st International Specialist Meeting on Amorphous Carbon, pp. 1–374. World Scientific Press (1997)Google Scholar

Copyright information

© Springer International Publishing AG 2017

Authors and Affiliations

  • Ahmed S. Wasfi
    • 1
    Email author
  • Hammad R. Humud
    • 1
  • Mohammed E. Ismael
    • 1
  1. 1.Physics Department, College of ScienceUniversity of BaghdadJadiriyaIraq

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