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Conclusions and Future Works

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Design for Manufacturability with Advanced Lithography

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Abstract

In this book, we have proposed a set of algorithms/methodologies to resolve issues in modern design for manufacturability (DFM) problems with advanced lithography. The methodologies proposed are flexible that they can be easily extended to handle other emerging lithography challenges in layout design stages.

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Authors and Affiliations

  1. ECE Department, The University of Texas, Austin, TX, USA

    Bei Yu & David Z. Pan

Authors
  1. Bei Yu
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  2. David Z. Pan
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© 2016 Springer International Publishing Switzerland

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Yu, B., Pan, D.Z. (2016). Conclusions and Future Works. In: Design for Manufacturability with Advanced Lithography. Springer, Cham. https://doi.org/10.1007/978-3-319-20385-0_6

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  • DOI: https://doi.org/10.1007/978-3-319-20385-0_6

  • Publisher Name: Springer, Cham

  • Print ISBN: 978-3-319-20384-3

  • Online ISBN: 978-3-319-20385-0

  • eBook Packages: EngineeringEngineering (R0)

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