Abstract
The plasma-enhanced chemical vapor deposition (PECVD) is an effective method for producing vertically-oriented graphene (VG) sheets, but it is also a very complex one because of the complexity associated with the plasma chemistry. In addition to the type of plasma sources discussed in Chap. 3, the morphology and structure of the PECVD-produced VG sheets are also strongly affected by a set of operating parameters, including precursors (e.g., feedstock gas type and composition, plasma gas type), the substrate temperature, and the operating pressure. In this chapter, we discuss two important operating parameters for the synthesis of VG in the PECVD process, specifically precursor and temperature.
Part of this chapter was adapted from our review article “Plasma-Enhanced Chemical Vapor Deposition Synthesis of Vertically-Oriented Graphene Nanosheets,” Nanoscale 5(12), 5180–5204, 2013 (DOI: 10.1039/C3NR33449J)—Reproduced by permission of The Royal Society of Chemistry.
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References
Jain, H. G., Karacuban, H., Krix, D., Becker, H.-W., Nienhaus, H., & Buck, V. (2011). Carbon nanowalls deposited by inductively coupled plasma enhanced chemical vapor deposition using aluminum acetylacetonate as precursor. Carbon, 49(15), 4987–4995.
Bo, Z., Yang, Y., Yu, K., Chen, J., Yan, J., & Cen, K. (2013). Plasma-enhanced chemical vapor deposition synthesis of vertically-oriented graphene nanosheets. Nanoscale, 5(12), 5180–5204.
Mori, T., Hiramatsu, M., Yamakawa, K., Takeda, K., & Hori, M. (2008). Fabrication of carbon nanowalls using electron beam excited plasma-enhanced chemical vapor deposition. Diamond and Related Materials, 17(7–10), 1513–1517.
Sato, G., Morio, T., Kato, T., & Hatakeyama, R. (2006). Fast growth of carbon nanowalls from pure methane using helicon plasma-enhanced chemical vapor deposition. Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications and Review Papers, 45(6A), 5210–5212.
Chuang, A. T. H., Boskovic, B. O., & Robertson, J. (2006). Freestanding carbon nanowalls by microwave plasma-enhanced chemical vapour deposition. Diamond and Related Materials, 15(4–8), 1103–1106.
Teii, K., Shimada, S., Nakashima, M., & Chuang, A. T. H. (2009). Synthesis and electrical characterization of n-type carbon nanowalls. Journal of Applied Physics, 106(8), 084303.
Soin, N., Roy, S. S., Lim, T. H., & McLaughlin, J. A. D. (2011). Microstructural and electrochemical properties of vertically aligned few layered graphene (FLG) nanoflakes and their application in methanol oxidation. Materials Chemistry and Physics, 129(3), 1051–1057.
Zhang, Y., Du, J. L., Tang, S., Liu, P., Deng, S. Z., Chen, J., et al. (2012). Optimize the field emission character of a vertical few-layer graphene sheet by manipulating the morphology. Nanotechnology, 23(1), 015202.
Mori, S., Ueno, T., & Suzuki, M. (2011). Synthesis of carbon nanowalls by plasma-enhanced chemical vapor deposition in a CO/H-2 microwave discharge system. Diamond and Related Materials, 20(8), 1129–1132.
Chatei, H., Belmahi, M., Assouar, M. B., Le Brizoual, L., Bourson, P., & Bougdira, J. (2006). Growth and characterisation of carbon nanostructures obtained by MPACVD system using CH4/CO2 gas mixture. Diamond and Related Materials, 15(4–8), 1041–1046.
Shiji, K., Hiramatsu, M., Enomoto, A., Nakamura, N., Amano, H., & Hori, M. (2005). Vertical growth of carbon nanowalls using rf plasma-enhanced chemical vapor deposition. Diamond and Related Materials, 14(3–7), 831–834.
Shang, N. G., Papakonstantinou, P., McMullan, M., Chu, M., Stamboulis, A., Potenza, A., et al. (2008). Catalyst-free efficient growth, orientation and biosensing properties of multilayer graphene nanoflake films with sharp edge planes. Advanced Functional Materials, 18(21), 3506–3514.
Zhu, M. Y., Outlaw, R. A., Bagge-Hansen, M., Chen, H. J., & Manos, D. M. (2011). Enhanced field emission of vertically oriented carbon nanosheets synthesized by C2H2/H-2 plasma enhanced CVD. Carbon, 49(7), 2526–2531.
Wang, J. J., Zhu, M. Y., Outlaw, R. A., Zhao, X., Manos, D. M., & Holloway, B. C. (2004). Synthesis of carbon nanosheets by inductively coupled radio-frequency plasma enhanced chemical vapor deposition. Carbon, 42(14), 2867–2872.
Obraztsov, A. N., Volkov, A. P., Nagovitsyn, K. S., Nishimura, K., Morisawa, K., Nakano, Y., et al. (2002). CVD growth and field emission properties of nanostructured carbon films. Journal of Physics D-Applied Physics, 35(4), 357–362.
Obraztsov, A. N., Zolotukhin, A. A., Ustinov, A. O., Volkov, A. P., Svirko, Y., & Jefimovs, K. (2003). DC discharge plasma studies for nanostructured carbon CVD. Diamond and Related Materials, 12(3–7), 917–920.
Gruen, D. M. (1999). Nanocrystalline diamond films. Annual Review of Materials Science, 29, 211–259.
Vizireanu, S., Stoica, S. D., Luculescu, C., Nistor, L. C., Mitu, B., & Dinescu, G. (2010). Plasma techniques for nanostructured carbon materials synthesis. A case study: Carbon nanowall growth by low pressure expanding RF plasma. Plasma Sources Science and Technology, 19(3), 034016.
Hiramatsu, M., Kato, K., Lau, C. H., Foord, J. S., & Hori, M. (2003). Measurement of C-2 radical density in microwave methane/hydrogen plasma used for nanocrystalline diamond film formation. Diamond and Related Materials, 12(3–7), 365–368.
Goyette, A. N., Matsuda, Y., Anderson, L. W., & Lawler, J. E. (1998). C-2 column densities in H-2/Ar/CH4 microwave plasmas. Journal of Vacuum Science and Technology a-Vacuum Surfaces and Films, 16(1), 337–340.
Shiomi, T., Nagai, H., Kato, K., Hiramatsu, M., & Nawata, M. (2001). Detection of C-2 radicals in low-pressure inductively coupled plasma source for diamond chemical vapor deposition. Diamond and Related Materials, 10(3–7), 388–392.
Zhu, W., Inspektor, A., Badzian, A. R., McKenna, T., & Messier, R. (1990). Effects of noble-gases on diamond deposition from methane-hydrogen microwave plasmas. Journal of Applied Physics, 68(4), 1489–1496.
Takeuchi, W., Ura, M., Hiramatsu, M., Tokuda, Y., Kano, H., & Hori, M. (2008). Electrical conduction control of carbon nanowalls. Applied Physics Letters, 92(21), 213103.
Hiramatsu, M., Shiji, K., Amano, H., & Hori, M. (2004). Fabrication of vertically aligned carbon nanowalls using capacitively coupled plasma-enhanced chemical vapor deposition assisted by hydrogen radical injection. Applied Physics Letters, 84(23), 4708–4710.
Kondo, S., Hori, M., Yamakawa, K., Den, S., Kano, H., & Hiramatsu, M. (2008). Highly reliable growth process of carbon nanowalls using radical injection plasma-enhanced chemical vapor deposition. Journal of Vacuum Science and Technology B, 26(4), 1294–1300.
Bo, Z., Yu, K., Lu, G., Wang, P., Mao, S., & Chen, J. (2011). Understanding growth of carbon nanowalls at atmospheric pressure using normal glow discharge plasma-enhanced chemical vapor deposition. Carbon, 49(6), 1849–1858.
Wang, Z., Shoji, M., & Ogata, H. (2011). Carbon nanosheets by microwave plasma enhanced chemical vapor deposition in CH4-Ar system. Applied Surface Science, 257(21), 9082–9085.
Wu, Y. H., Qiao, P. W., Chong, T. C., & Shen, Z. X. (2002). Carbon nanowalls grown by microwave plasma enhanced chemical vapor deposition. Advanced Materials, 14(1), 64–67.
Malesevic, A., Vitchev, R., Schouteden, K., Volodin, A., Zhang, L., Van Tendeloo, G., et al. (2008). Synthesis of few-layer graphene via microwave plasma-enhanced chemical vapour deposition. Nanotechnology, 19(30), 305604.
Zeng, L., Lei, D., Wang, W., Liang, J., Wang, Z., Yao, N., et al. (2008). Preparation of carbon nanosheets deposited on carbon nanotubes by microwave plasma-enhanced chemical vapor deposition method. Applied Surface Science, 254(6), 1700–1704.
Zhu, M., Wang, J., Holloway, B. C., Outlaw, R. A., Zhao, X., Hou, K., et al. (2007). A mechanism for carbon nanosheet formation. Carbon, 45(11), 2229–2234.
Kurita, S., Yoshimura, A., Kawamoto, H., Uchida, T., Kojima, K., Tachibana, M., et al. (2005). Raman spectra of carbon nanowalls grown by plasma-enhanced chemical vapor deposition. Journal of Applied Physics, 97(10), 104320.
Cheng, C. Y., & Teii, K. (2012). Control of the growth regimes of nanodiamond and nanographite in microwave plasmas. IEEE Transactions on Plasma Science, 40(7), 1783–1788.
Kondo, S., Kawai, S., Takeuchi, W., Yamakawa, K., Den, S., Kano, H., et al. (2009). Initial growth process of carbon nanowalls synthesized by radical injection plasma-enhanced chemical vapor deposition. Journal of Applied Physics, 106(9), 094302.
Hori, M., Kondo, H., & Hiramatsu, M. (2011). Radical-controlled plasma processing for nanofabrication. Journal of Physics D-Applied Physics, 44(17), 174027.
Zhu, M., Wang, J., Outlaw, R. A., Hou, K., Manos, D. M., & Holloway, B. C. (2007). Synthesis of carbon nanosheets and carbon nanotubes by radio frequency plasma enhanced chemical vapor deposition. Diamond and Related Materials, 16(2), 196–201.
Rao, B. P. C., Maheswaran, R., Ramaswamy, S., Mahapatra, O., Gopalakrishanan, C., & Thiruvadigal, D. J. (2009). Low temperature growth of carbon nanostructures by radio frequency-plasma enhanced chemical vapor deposition (low temperature growth of carbon nanostructures by RF-PECVD). Fullerenes, Nanotubes, and Carbon Nanostructures, 17(6), 625–635.
Yu, K., Bo, Z., Lu, G., Mao, S., Cui, S., Zhu, Y., et al. (2011). Growth of carbon nanowalls at atmospheric pressure for one-step gas sensor fabrication. Nanoscale Research Letters, 6, 202.
Yamabe, C., Buckman, S. J., & Phelps, A. V. (1983). Measurement of free-free emission from low-energy-electron collisions with AR. Physical Review A, 27(3), 1345–1352.
Shang, N. G., Staedler, T., & Jiang, X. (2006). Radial textured carbon nanoflake spherules. Applied Physics Letters, 89(10), 103112.
Wang, E. G., Guo, Z. G., Ma, J., Zhou, M. M., Pu, Y. K., Liu, S., et al. (2003). Optical emission spectroscopy study of the influence of nitrogen on carbon nanotube growth. Carbon, 41(9), 1827–1831.
Vandevelde, T., Wu, T. D., Quaeyhaegens, C., Vlekken, J., D’Olieslaeger, M., & Stals, L. (1999). Correlation between the OES plasma composition and the diamond film properties during microwave PA-CVD with nitrogen addition. Thin Solid Films, 340(1–2), 159–163.
Wu, Y. H., Yang, B. J., Zong, B. Y., Sun, H., Shen, Z. X., & Feng, Y. P. (2004). Carbon nanowalls and related materials. Journal of Materials Chemistry, 14(4), 469–477.
Kersten, H., Deutsch, H., Steffen, H., Kroesen, G. M. W., & Hippler, R. (2001). The energy balance at substrate surfaces during plasma processing. Vacuum, 63(3), 385–431.
Krivchenko, V. A., Dvorkin, V. V., Dzbanovsky, N. N., Timofeyev, M. A., Stepanov, A. S., Rakhimov, A. T., et al. (2012). Evolution of carbon film structure during its catalyst-free growth in the plasma of direct current glow discharge. Carbon, 50(4), 1477–1487.
Fridman, A., & Kennedy, L. (2006). Plasma physics and engineering. New York: Taylor & Francis.
Krivchenko, V., Shevnin, P., Pilevsky, A., Egorov, A., Suetin, N., Sen, V., et al. (2012). Influence of the growth temperature on structural and electron field emission properties of carbon nanowall/nanotube films synthesized by catalyst-free PECVD. Journal of Materials Chemistry, 22(32), 16458–16464.
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Chen, J., Bo, Z., Lu, G. (2015). PECVD Synthesis of Vertically-Oriented Graphene: Precursor and Temperature Effects. In: Vertically-Oriented Graphene. Springer, Cham. https://doi.org/10.1007/978-3-319-15302-5_4
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DOI: https://doi.org/10.1007/978-3-319-15302-5_4
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