Abstract
Heavy doping of semiconductors offers a range of new functionalities that make these materials highly attractive for future information processing technologies like spintronics or quantum computing. Similar to ferromagnetism in diluted magnetic semiconductors it is even possible to achieve a superconducting state in heavily doped elemental semiconductors. Superconductivity in doped semiconductors is of increasing interest for both, fundamental research and applied physics. Herein we report on superconducting germanium layers fabricated by gallium ion implantation and subsequent flash lamp- or rapid thermal annealing.
The intent of the following chapter is to provide a brief introduction of the physics of superconducting semiconductors. It is shown that for these materials it is a key challenge to achieve electrically active dopant concentrations well above the metal insulator transition and at the same time to avoid dopant clustering. In strong contrast to all other doping techniques, ion implantation is not limited to the equilibrium solid solubility of the dopants in the host material. Furthermore, it is widely used in nowadays microelectronics technology which makes this process promising for potential applications.
The microstructure and electrical transport of germanium layers implanted with 2 or 4×1016 cm−2 gallium is studied in detail. We extract some information of the influence of gallium rich precipitates that could be formed during ion implantation and subsequent thermal processing on the electrical transport properties. The fabricated layers show p-type conductivity and a charge carrier concentration exceeding the metal insulator transition. This explains a temperature independent resistance in the normal conducting state.
Structural investigations provided by means of Rutherford backscattering spectrometry and transmission electron microscopy reveal distinct differences in the layer morphology depending on the annealing conditions. During flash lamp annealing with a pulse length of 3 milliseconds the layers partly recrystallize via solid phase epitaxy that is stopped by random nucleation and growth leading to a nanocrystalline surface layer. Gallium diffusion and dose loss is clearly suppressed due to the short annealing time. Rapid thermal annealing for 60 seconds provides time enough for a complete solid phase epitaxy. Gallium segregates at the germanium surface during this process. Etching experiments show that the gallium rich regions are responsible for the superconductivity with a critical temperature of 6 K. Therefore, the critical temperature becomes comparable to amorphous gallium films. Based on these findings one can conclude that increasing gallium concentration and thermal budget during annealing lead to gallium segregation which significantly changes the electrical transport and superconducting properties.
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Acknowledgements
Last but not least, the authors acknowledge helpful discussions and experimental contributions of following persons: F. Arnold, M. Bartkowiak, R. Beyerl, S. Facsko, G. Gobsch, M. Helm, T. Herrmannsdörfer, H. Hortenbach, O. Ignatchik, M. Uhlarz, A. Mücklich, M. Posselt, H. Reuther, B. Schmidt, T. Schumann, W. Skorupa, R. Skrotzki, S. Teichert, M. Voelskow, C. Wündisch, J. Wosnitza.
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Fiedler, J., Heera, V. (2014). Superconducting Gallium Implanted Germanium. In: Skorupa, W., Schmidt, H. (eds) Subsecond Annealing of Advanced Materials. Springer Series in Materials Science, vol 192. Springer, Cham. https://doi.org/10.1007/978-3-319-03131-6_4
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