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Growth and Characterization of Nitrogen Incorporated Amorphous Carbon Films Having Embedded Nanocrystallies

  • R. K. Tripathi
  • O. S. Panwar
  • Ishpal
  • Sreekumar Chockalingam
Conference paper
Part of the Environmental Science and Engineering book series (ESE)

Abstract

This paper reports the growth and characterization of nitrogen incorporated amorphous carbon films having embedded nanocrystallites deposited by filtered anodic jet carbon arc technique. The films are characterized by X-ray diffraction, scanning electron microscopy, atomic force microscopy, Raman, residual stress and nanoindentation. The properties are found to depend on the substrate bias. The film deposited at −60 V substrate bias shows maximum hardness of 24 GPa and elastic modulus of 215 GPa.

Keywords

N films Nanocrystallites XRD Raman Residual stress Nanoindentation Filtered anodic jet carbon arc 

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Notes

Acknowledgments

The authors are grateful to Prof. R. C. Budhani, Director, CSIR-National Physical Laboratory, New Delhi (India) for his kind permission to publish this work. We thank to Mr. K. N. Sood for providing SEM micrograph, to Dr. V. P. S. Awana for providing XRD patterns, to Mr. Sandeep for providing AFM micrograph and to Dr. Sushil Kumar for useful discussion. Mr. R. K. Tripathi is grateful to the Ministry of Science and Technology and Ministry of New and Renewable Energy, Government of India for providing financial assistant.

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Copyright information

© Springer International Publishing Switzerland 2014

Authors and Affiliations

  • R. K. Tripathi
    • 1
  • O. S. Panwar
    • 1
  • Ishpal
    • 2
  • Sreekumar Chockalingam
    • 1
  1. 1.Polymorphic Carbon Thin Films Group, Physics of Energy Harvesting DivisionCSIR-National Physical LaboratoryNew DelhiIndia
  2. 2.Department of Physics and AstrophysicsUniversity of DelhiDelhiIndia

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