Characteristic and Fluctuation of Multi-fin FinFETs

  • Hui-Wen Cheng
  • Yiming LiEmail author
Part of the Lecture Notes in Nanoscale Science and Technology book series (LNNST, volume 17)


As the gate length of a metal oxide semiconductor field effect transistor (MOSFET) decreases, vertical channel transistors, such as the fin-typed field effect transistors (FinFETs) have attracted much attention because of their promising characteristics. In this chapter, we explore the electrical characteristics of 16 nm multi-fin FinFETs with different fin aspect ratios [AR = fin height (H fin)/fin width (W fin)]. The 16-nm multi-fin FinFET device and circuits’ characteristics are simulated by solving a set of 3D quantum-mechanically corrected transport equations coupling with circuit nodal equations self-consistently. Device’s electrical characteristics and their fluctuation are discussed with respect to the AR varying from 0.5 to 2 including the number of silicon channel fins. Dynamic and transfer characteristics of static random access memory, inverter, and analog circuits using single-/multiple-fin FinFETs are further discussed, respectively.


Gate Length Current Mirror Kinetic Monte Carlo Static Random Access Memory Gate Capacitance 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.



This work was supported in part by the Taiwan National Science Council (NSC), under Contracts NSC-101-2221-E-009-092, NSC-100-2221-E-009-018, and NSC-99-2221-E-009-175, and by Taiwan Semiconductor Manufacturing Company, Hsinchu, Taiwan, under a 2011-2013 grant.


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Copyright information

© Springer International Publishing Switzerland 2013

Authors and Affiliations

  1. 1.Parallel and Scientific Computing Laboratory, Department of Electrical and Computer EngineeringNational Chiao Tung UniversityHsinchuTaiwan, ROC

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