Abstract
The performance of the burs and tools coated with diamond depend on the properties of the films deposited including the structure, morphology and adhesion onto the substrate material. These film characteristics are in turn controlled by a number of factors including the VFCVD reactor parameters such as substrate temperature, substrate bias, pressure, methane concentration, plasma characteristics and affinity of the substrate for diamond nucleation. In this chapter the effects of process parameters on the structure and morphology of the films deposited and therefore control of the film properties.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
Ager I, JW, Drory MD (1993) Quantitative measurement of residual biaxial stress by Raman spectroscopy in diamond grown on a Ti alloy by chemical vapor deposition. Phys Rev B 48(4):2601
Amirhaghi S et al. (2001) Diamond coatings on tungsten carbide and their erosive wear properties. Surf Coat Technol 135(2):126–138
Butler JE et al. (2009) Recent progress in the understanding of CVD growth of diamond. CVD Diamonds Electron Devices Sens:103–124
Cabral G et al. (2006) Diamond chemical vapour deposition on seeded cemented tungsten carbide substrates. Thin Solid Films 515(1):158–163
Cock AM et al. (1994) Comparison of two models of thin diamond film microhardness data to predict the hardness of CVD diamond. Diam Relat Mater 3(4–6):783–786
Deuerler F et al. (1996) Pretreatment of substrate surface for improved adhesion of diamond films on hard metal cutting tools. Diam Relat Mater 5(12):1478–1489
Filik J et al. (2006) Raman spectroscopy of diamondoids. Spectrochim Acta Part A Mol Biomol Spectrosc 64(3):681–692
Mankelevich YA, May PW (2008) New insights into the mechanism of CVD diamond growth: single crystal diamond in MW PECVD reactors. Diam Relat Mater 17(7):1021–1028
Matsumoto S et al. (1982) Vapor deposition of diamond particles from methane. Jpn J Appl Phys 21(4A):L183
May PW et al. (2010) Simulations of polycrystalline CVD diamond film growth using a simplified Monte Carlo model. Diam Relat Mater 19(5–6):389–396
Murakawa M, Takeuchi S (1991) Mechanical applications of thin and thick diamond films. Surf Coat Technol 49(1):359–364
Polini R et al. (2004) Cutting force and wear evaluation in peripheral milling by CVD diamond dental tools. Thin Solid Films 469:161–166
Polini R et al. (2010) Wear resistance of nano-and micro-crystalline diamond coatings onto WC-Co with Cr/CrN interlayers. Thin Solid Films 519(5):1629–1635
Schneider A et al. (2010) Enhanced tribological performances of nanocrystalline diamond film. Int J Refract Metal Hard Mater 28(1):40–50
Sein H et al. (2004a) Enhancing nucleation density and adhesion of polycrystalline diamond films deposited by HFCVD using surface treaments on co cemented tungsten carbide. Diam Relat Mater 13(4):610–615
Sein H et al. (2004b) Performance and characterisation of CVD diamond coated, sintered diamond and WC-Co cutting tools for dental and micromachining applications. Thin Solid Films 447–448:455–461
Wang BB et al. (2001) Theoretical analysis of ion bombardment roles in the bias-enhanced nucleation process of CVD diamond. Diam Relat Mater 10(9):1622–1626
Wang WL et al. (1999) Mechanism of diamond nucleation enhancement by electron emission via hot filament chemical vapor deposition. Diam Relat Mater 8(2):123–126
Xianglin LI (2008) High-rate diamond deposition by microwave plasma CVD, ProQuest
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
Copyright information
© 2014 The Author(s)
About this chapter
Cite this chapter
Ahmed, W. et al. (2014). Controlling Structure and Morphology. In: Chemical Vapour Deposition of Diamond for Dental Tools and Burs. SpringerBriefs in Materials. Springer, Cham. https://doi.org/10.1007/978-3-319-00648-2_7
Download citation
DOI: https://doi.org/10.1007/978-3-319-00648-2_7
Published:
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-00647-5
Online ISBN: 978-3-319-00648-2
eBook Packages: Chemistry and Materials ScienceChemistry and Material Science (R0)