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UV and E-Beam Direct Patterning of Photosensitive CSD Films

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Chemical Solution Deposition of Functional Oxide Thin Films

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Abstract

UV- and E-beam direct patterning processes using photosensitive precursor films are reviewed in this chapter. For the UV patterning process, discussed in the first part, reaction processes of precursors, such as metal alkoxides modified with β-diketones and metal complexes of carboxylic acids, with UV-irradiation are reported. The discussion of multi-component oxide film, as well as simple oxide film preparation, some applications of direct UV-patterning, and limitation of this process completes this section. The second part covers the progress made in the direct sub-10 nm electron beam patterning of metal oxides over the last 30 years, moving from physical deposition to chemical solution deposition of resists. Patterning of inorganic resists began with thermally evaporated metal halides. They were soon taken over by sputtered metal oxide films due to their excellent environmental stability. However, these inorganic materials, both halides and oxides, suffered from very steep electron dose requirement, thus rendering them useless for practical applications. This gave way to highly electron beam-sensitive chemical solution deposited stabilized metal alkoxides and metal naphthenates, with sensitively close to conventional electron beam resists such as poly(methylmethacrylate), PMMA, and calixarene. Furthermore, they show excellent line edge roughness characteristics at sub-10 nm scale, which is currently unmatched by any other electron beam resist. Recent applications of these resists such as etch mask and their suitability as gate oxides closes the chapter.

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Authors and Affiliations

  1. Faculty of Engineering, Hokkaido University, Sapporo, Hokkaido, 060-8628, Japan

    Kiyoharu Tadanaga

  2. Patterning and Fabrication Capability Group, Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research Link, Singapore, 117602, Republic of Singapore

    Mohammad S. M. Saifullah

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  1. Kiyoharu Tadanaga
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  2. Mohammad S. M. Saifullah
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Correspondence to Kiyoharu Tadanaga or Mohammad S. M. Saifullah .

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Editors and Affiliations

  1. RWTH Aachen University, Aachen, Germany

    Theodor Schneller

  2. RWTH Aachen University, Aachen, Germany

    Rainer Waser

  3. Jožef Stefan Institute, Ljubljana, Slovenia

    Marija Kosec

  4. University of Illinois at Urbana-Champai, Urbana, Illinois, USA

    David Payne

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Tadanaga, K., Saifullah, M.S.M. (2013). UV and E-Beam Direct Patterning of Photosensitive CSD Films. In: Schneller, T., Waser, R., Kosec, M., Payne, D. (eds) Chemical Solution Deposition of Functional Oxide Thin Films. Springer, Vienna. https://doi.org/10.1007/978-3-211-99311-8_20

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