Abstract
We perform theoretical and numerical studies of nano-structured thin-film growth at condensation in a prototype model of ion plasma device. We construct an appropriate model of plasma-condensate system, by taking into account interactions of adsorbed particles and an influence of the electrical field near substrate, inducing anisotropy in transferring of adatoms between neighbor layers in multi-layer system. We analyze an influence of the electrical field strength onto realization of first-order phase transitions. We found the range of main system parameters responsible for pattern formation with realization of separated adsorbate islands on a substrate or separated holes inside adsorbate matrix during condensation. We discuss a possibility of the main system parameters, related to strength of the electrical field near substrate, interaction energy of adsorbate and adsorption coefficient, to control dynamics of adsorbate island formation, morphology of the surface and statistical properties of the surface structures. We will demonstrate that two-dimensional structures, obtained from the derived model for the intermediate level of growing thin film, can be represented as three-dimensional pyramidal-like structures. This study gives a better understanding detail of self-organization of adatoms into separated nano-sized islands in ion plasma devices.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Similar content being viewed by others
References
Ohring M (2001) Materials science of thin films, 2nd edn. Academic press, p 794
Marchand P, Hassan IA, Parkin IP et al (2013) Dalton Trans 42:9406
Benning L, Waychunas G (2008) Nucleation, growth, and aggregation of mineral phases: mechanisms and kinetic controls. In: Brantley S, Kubicki J, White A (eds) Kinetics of water-rock interaction. Springer, New York, NY
Ferrando R, Jellinek J, Johnston RL (2008) Chem Rev 108:845
Jortner J (1992) Z Phys D At Mol Clusters 24:247
Chaudhuri RG, Paria S (2012) Chem Rev 112:2373
Johnston RL (1998) Philos Trans R Soc London Ser A 356:211
Campbell SA (1996) The science and engineering of microelectronic fabrication. Oxford University Press, New York
Masalski J, Gluszek J, Zabrzeski J et al (1999) Thin Solid Films 349:186
Vitanov P, Harizanova A, Ivanova T et al (2009) Thin Solid Films 517:6327
Chin AK (1983) J Vac Sci Technol B Microelectron Nanom Struct 1:72
Echigoya J, Enoki H (1996) J Mater Sci 31:5247
Gottmann J, Husmann A, Klotzbiicher T et al (1998) Surf Coatings Technol 100–101:415
Carmona-Tellez S, Guzman-Mendoza J, Aguilar-Frutis M (2008) J Appl Phys 103:34105
Aguilar-frutis M, Garcia M, Falcony C et al (2001) Thin Solid Films 389:200
Dhonge BP, Mathews T, Sundari ST et al (2011) Appl Surf Sci 258:1091
Ortiz JC, Alonso A (2002) J Mater Sci Mater Electron 13:7
Wu Y, Choy KL (2004) Surf Coat Technol 180–181:436
Pohl K, Bartelt MC, de la Figuera J et al (1999) Nature 397:238
Mo YW, Swartzentruber BS, Kariotis R et al (1989) Phys Rev Lett 63:2393
Cirlin GE, Egorov VA, Okolov LV, Werner P (2002) Semiconductors 36:1294
Bucher JP, Hahn E, Fernandez P et al (1994) Europhys Lett 27:473
Besenbacher F, Pleth Nielsen L, Spunger PT (1997) Chapter 6. Surface alloying in het-eroepitaxial metal-on-metal growth. In: King DA, Woodruff DP (eds) The chemical physics of solid surfaces 8:207. Elsevier
Perekrestov VI, Olemskoi AI, Kosminska YuO, Mokrenko AA (2009) Phys Lett A 373:3386
Kosminska YA, Mokrenko AA, Perekrestov VI (2011) Tech Phys Lett 37:538
Sree Harsha KS (2006) Principles of physical vapor deposition of thin films. Elesevier
Batogkh D, Hildebrant M, Krischer F, Mikhailov A (1997) Phys Rep 288:435
Hildebrand M, Mikhailov AS, Ertl G (1998) Phys Rev Lett 81:2602
Hildebrand M, Mikhailov AS, Ertl G (1998) Phys Rev E 58:5483
Walgraef D (2002) Phys E 15:33
Kharchenko VO, Kharchenko DO, Kokhan SV et al (2012) Phys Scripta 86:055401
Kharchenko VO, Kharchenko DO (2012) Phys Rev E 86:041143
Kharchenko VO, Kharchenko DO, Dvornichenko AV (2014) Surf Sci 630:158
Kharchenko VO, Kharchenko DO (2015) Surf Sci 637–638:90
Kharchenko VO, Kharchenko DO, Yanovsky VV (2017) Nanoscale Res Lett 12:337
Dvornichenkoa AV, Kharchenkob DO, Lysenkob IO (2019) J Cryst Growth 514:1
Casal SB, Wio HS, Mangioni S (2002) Physica A 311:443
Mangioni SE, Wio HS (2005) Phys Rev E 71:056203
Mangioni SE (2010) Physica A 389:1799
Walgraef D (2003) Physica E 18:393
Walgraef D (2004) Int J Quant Chem 98:248
Kharchenko DO, Kharchenko VO, Lysenko IO (2011) Phys Scripta 83:045802
Kharchenko DO, Kharchenko VO, Zhylenko TI et al (2013) Eur Phys J B 86(4):175
Kharchenko VO, Kharchenko DO, Dvornichenko AV (2015) Eur Phys J B 88:3
Swift J, Hohenberg PC (1977) Phys Rev A 15:319
Kharchenko D, Lysenko I, Kharchenko V (2010) Physica A 389:3356
Elder KR, Grant M (2004) Phys Rev E 70:051605
Kharchenko VO, Kharchenko DO (2012) Eur Phys J B 85:383
Kharchenko DO, Kharchenko VO, Bashtova AI (2014) Radiat Eff Defects Solids 169:418
Kharchenko VO, Kharchenko DO (2014) Phys Rev E 89:042133
Leonhardt D, Han SM (2009) Surf Sci 603:2624
Hunter KI, Held JT, Mkhoyan KA et al (2017) ACS Appl Mater Interf 9:8263
Perekrestov VI, Kosminska YO, Kornyushchenko AS et al (2013) Physica B 411:140
Kornyushchenko AS, Natalich VV, Perekrestov VI (2016) J Cryst Growth 442:68
Acknowledgements
Support of this research by the Ministry of Education and Science of Ukraine, project No. 0117U003927, is gratefully acknowledged.
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2020 Springer Nature Switzerland AG
About this paper
Cite this paper
Kharchenko, V.O., Dvornichenko, A.V. (2020). Modeling Self-organization of Adsorbate at Chemical Vapor Deposition in Accumulative Ion Plasma Devices. In: Fesenko, O., Yatsenko, L. (eds) Nanooptics and Photonics, Nanochemistry and Nanobiotechnology, and Their Applications . Springer Proceedings in Physics, vol 247. Springer, Cham. https://doi.org/10.1007/978-3-030-52268-1_8
Download citation
DOI: https://doi.org/10.1007/978-3-030-52268-1_8
Published:
Publisher Name: Springer, Cham
Print ISBN: 978-3-030-52267-4
Online ISBN: 978-3-030-52268-1
eBook Packages: Physics and AstronomyPhysics and Astronomy (R0)