Abstract
Narrow-band pass, band-pass and band-blocking IR filters are used intensively in optical communications, imaging, spectroscopy, astronomy, and many other applications. Currently available filters are based on interference in multilayer stacks and have to be used with well-collimated beams and carefully aligned angles of incidence. The angular dependence of the pass band position for IR filters used in, for example, DWDM (Dense Wavelength Division Multiplexing) requires even tighter alignment (meaning complexity) than with UV filters discussed previously in this paper due to much more strict specifications. Omnidirectional IR filters, based on macroporous silicon technology, recently proposed in [1] and reviewed in [2], have the potential to solve this problem. This type of filters is based on macroporous silicon and utilizes the waveguide transmission mode discussed in Chapter 5. It will be analyzed here in more detail.
This is a preview of subscription content, log in via an institution to check access.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
Kochergin V, (2003) Omnidirectional Optical Filters. Kluwer Academic Publishers, Boston, ISBN 1-4020-7386-0.
Kochergin V, Föll H, (2006) Novel optical elements made from porous silicon. Review Materials Science and Engineering R, 52:93–140.
Othons A, Kalli K, (1999) Fiber Bragg Gratings: Fundamentals and Applications in Telecommunications and Sensing, Artech House.
Lehmann V, (2005) Porous silicon matrix for chemical synthesis and chromatograpy. Phys. Stat. Sol. 202:1365–1368.
Kochergin V, Swinehart PR, (2003)U.S. Patent Application 20040134879.
Matthias S, Mueller F, Jamais C, Wehrspohn RB, Goesele U, (2004) Large-Area Three-Dimensional Structuring by Electrochemical Etching and Lithography. Adv. Mat. 16: 2166–2170.
Matthias S, Mueller F, Schilling J, Goesele U, (2005) Pushing the limits of macroporous silicon etching. Appl. Phys. A 80: 1391–1396.
Föll H, Christophersen M, Carstensen J, Hasse G, (2002) Formation and application of porous Si. Mat. Sci. Eng. R 39: 93–141.
Föll H, Langa S, Carstensen J, Christophersen M, Tiginyanu IM, (2003) Review: Pores in III-V Semiconductors. Adv. Materials, 15:183–198.
Rights and permissions
Copyright information
© 2009 Springer-Verlag London Limited
About this chapter
Cite this chapter
(2009). Omnidirectional IR Filters. In: Porous Semiconductors. Engineering Materials and Processes. Springer, London. https://doi.org/10.1007/978-1-84882-578-9_11
Download citation
DOI: https://doi.org/10.1007/978-1-84882-578-9_11
Publisher Name: Springer, London
Print ISBN: 978-1-84882-577-2
Online ISBN: 978-1-84882-578-9
eBook Packages: EngineeringEngineering (R0)