Skip to main content
SpringerLink
Log in
Book cover

Tetrahedrally-Bonded Amorphous Semiconductors pp 1–10Cite as

Glow Discharge Deposition of Amorphous Semiconductors: The Early Years

  • Chapter

Part of the book series: Institute for Amorphous Studies Series ((IASS))

Abstract

During the past ten years, we have seen an unprecedented interest in the electrodeless r.f. glow discharge technique as a method for depositing thin films of non-crystalline semiconductors. This is, in the main, due to the great advances in the understanding of the behaviour of glow discharge (GD) deposited amorphous silicon (a-Si) that followed the successful n and p-type doping announced by Spear and Le Comber in 19751 and the subsequent demonstration of practical a-Si solar cells.2,3

This is a preview of subscription content, log in via an institution.

Chapter
USD   29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD   39.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD   54.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Learn about institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. W.E. Spear and P.G. Le Comber, Solid State Commun. 17: 1193 (1975).

    Article  Google Scholar 

  2. D.E. Carlson and C.R. Wronski, Appl. Phys. Lett. 28: 671 (1976).

    Article  CAS  Google Scholar 

  3. W.E. Spear, P.G. Le Comber, S. Kinmond and M.H. Brodsky, Appl. Phys. Lett. 28: 105 (1976).

    Article  CAS  Google Scholar 

  4. J.M. Wilson, Research, 12: 91 (1959).

    CAS  Google Scholar 

  5. R.C. Chittick, J.H. Alexander and H.F. Sterling, J. Electrochem. Soc. 116: 77 (1969).

    Article  CAS  Google Scholar 

  6. R.C. Chittick, J. Non-Cryst. Solids 3: 255 (1970).

    Article  CAS  Google Scholar 

  7. H.F. Sterling, R.C.G. Swann, Solid State Electronics 8: 653 (1965).

    Article  CAS  Google Scholar 

  8. H.F. Sterling, R.C.G. Swann, Physics and Chemistry of Glasses 6: 108 (1965).

    Google Scholar 

  9. H.F. Sterling, C.F. Drake, BP 1006803 May 10th 1963.

    Google Scholar 

  10. H.F. Sterling, J.H. Alexander, R.J. Joyce, Le Vide, No. Special, AVI SEM, October 1966.

    Google Scholar 

  11. R.J. Joyce, H.F. Sterling and J.H. Alexander, Thin Solid Films 1:481 (1967/68).

    Google Scholar 

  12. H.F. Sterling, R.C.G. Swann, BP1104935, 8th May 1964.

    Google Scholar 

  13. H.F. Sterling, J.H. Alexander and R.J. Joyce, Special Ceramics 4:139, British Ceramic Research Assoc. (1968)

    Google Scholar 

  14. th Exhibition of the Institute of Physics and the Physical Society, Manchester, England, April 5th-8th 1965.

    Google Scholar 

  15. The Guardian, “Matchbox computer nearer” April 6th 1965

    Google Scholar 

  16. M.V. Coleman and D.J.D. Thomas, Phys. Stat. Sol., 24: K111 (1967).

    Article  CAS  Google Scholar 

  17. D.L. Staebler and C.R. Wronski, J. Appl. Phys. 51: 3262 (1980).

    Article  CAS  Google Scholar 

  18. W.E. Spear and P.G. Le Comber, Phil. Mag. 33: 935 (1976).

    Article  CAS  Google Scholar 

  19. J. Tauc, A. Abraham, R. Zallen and M. Slade, J. Non-Cryst. Solids 4: 279 (1970).

    Article  CAS  Google Scholar 

  20. P.G. Le Comber and W.E. Spear, Phys. Rev. Letters 25: 509 (1970).

    Article  Google Scholar 

  21. N.F. Mott, Phil. Mag. 19: 835. (1969).

    Article  CAS  Google Scholar 

  22. M.H. Cohen, H. Fritzche and S.R. Ovshinsky, Phys. Rev. Lett. 22: 1065 (1969).

    Article  CAS  Google Scholar 

  23. N.F. Mott and E.A. Davis, “Electronic Processes in Non-Crystalline Materials,” Clarendon Press, Oxford, (1979).

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Standard Telecommunication Laboratories, London Road, Harlow, Essex, UK

    R. C. Chittick & H. F. Sterling

Authors
  1. R. C. Chittick
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. H. F. Sterling
    View author publications

    You can also search for this author in PubMed Google Scholar

Editor information

Editors and Affiliations

  1. Massachusetts Institute of Technology, Cambridge, Massachusetts, USA

    David Adler

  2. University of Chicago, Chicago, Illinois, USA

    Hellmut Fritzsche

Rights and permissions

Reprints and permissions

Copyright information

© 1985 Springer Science+Business Media New York

About this chapter

Cite this chapter

Chittick, R.C., Sterling, H.F. (1985). Glow Discharge Deposition of Amorphous Semiconductors: The Early Years. In: Adler, D., Fritzsche, H. (eds) Tetrahedrally-Bonded Amorphous Semiconductors. Institute for Amorphous Studies Series. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-5361-2_1

Download citation

  • DOI: https://doi.org/10.1007/978-1-4899-5361-2_1

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4899-5363-6

  • Online ISBN: 978-1-4899-5361-2

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics

Search

Navigation