Removal of Particles from Deionized Water in a Recirculating Bath by Etchant Filters

  • John Robertson
  • Robert Goozner


The effectiveness of several etchant filters to remove particulates from a recirculating bath was evaluated in a semiconductor manufacturing cleanroom. The ability of the filters to remove a latex bead challenge from the bath as a function of time was measured using two methods:
  1. 1.

    Counting particles in the bath liquid using an automatic liquid particle counter equipped with a batch sampler.

  2. 2.

    Counting particles adhering to silicon wafers in the bath and counting the adhered particles using a surface particle scanner.



Silicon Wafer High Flow Rate Particle Count Latex Bead Liquid Particle 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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  1. 1.
    P. Burggraaf, Applied wet-chemical microfiltration, Semiconductor Intl., 86-89 (March 1985).Google Scholar
  2. 2.
    V. Krygier, M. Latham, R. Conway, Automatic particle measurements in liquids used by the semiconductor industry downstream of fine membrane filters, Proc. Fourth Annual Semiconductor Pure Water Conference, San Francisco (1985) pp. 71-87.Google Scholar
  3. 3.
    B. Gotlinsky, “Removal Rating of Pall Fluorodyne Super Etch Filter In Recirculating Service,” Pall Corporation Publication STR REB100, East Hill, N.Y. (1987).Google Scholar
  4. 4.
    V. Krygier, Rating of fine membrane filter used in the semiconductor industry, Proc. Fifth Annual Semiconductor Pure Water Conference, San Francisco (1986) pp. 232-255.Google Scholar

Copyright information

© Springer Science+Business Media New York 1990

Authors and Affiliations

  • John Robertson
    • 1
  • Robert Goozner
    • 2
  1. 1.Delco ElectronicsKokomoUSA
  2. 2.Pall CorporationGlen CoveUSA

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