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Characterization of the Particle Loading in Deionized Water Systems by Automated SEM Analysis

  • T. B. Vander Wood
  • L. D. Detter

Abstract

Characterization of the particles found in ultrapure water systems should be a standard complement to routine monitoring of particle concentration. Scanning electron microscopy combined with energy dispersive x-ray spectrometry is the technique of choice for particle characterization, but can be very time consuming. Automation of the system for particle detection and elemental analysis largely overcomes this disadvantage, and allows for detection, sizing and characterization of hundreds to thousands of particles isolated from a pure water system (e.g., by a point-of-use filter), all without human intervention after initial setup. Automated systems commonly in use provide accurate sizing and compositional information, but are limited to particles larger than approximately 0.5 μm, and rely on the operator to anticipate possible particle types (e.g., stainless steel, silica). Improvements anticipated for the near future include a smaller minimum size, ultimately approximately 0.05 μm by use of transmission electron microscopy, and a posteriori particle classification by statistical techniques.

Keywords

Particle Type Average Aspect Ratio Particulate Contaminant Pure Water System Automate Sizing 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    K. Yabe, Y. Motomura, H. Ishikawa, T. Mizuniwa and T. Ohmi, Responding to the future quality demands of ultrapure water, Microcontamination, 7(2), 35–46, (1989).Google Scholar
  2. 2.
    P.A. McConnelee, S.J. Poirer and R. Hanselka, Water quality improvements and VLSI defect density, Semiconductor International, 9(8), 82–85, (1986).Google Scholar
  3. 3.
    K. Skidmore, Filter chemicals at point of use for ultrapurity, Semiconductor International, 11(10), 66–71, (1988).Google Scholar
  4. 4.
    N.J. Csikai and D.J. Barnard, Jr., Counting particles in mobile liquid chemicals for semiconductor processing, Microcontamination, 4(11), 45–50, (1986).Google Scholar
  5. 5.
    K. Dillenbeck, Advances in particle-counting techniques for semiconductor process chemicals, Microcontamination, 5(2), 30–38, (1987).Google Scholar
  6. 6.
    K. Yabe, T. Kumagai, H. Ishikawa, S. Akigama, T. Mizuniwa and T. Ohmi, Evaluating equipment technologies for future monitoring demands of ultrapure water, Microcontamination, 7(3), 25–30, (1989).Google Scholar
  7. 7.
    M.K. Balazs, Measuring and identifying particles in ultrapure water, Microcontamination, 6(5), 35–39, (1988).Google Scholar
  8. 8.
    T.B. Vander Wood, Identification of particulate contaminants in I.C. manufacture, Solid State Technology, 28(8), 177–182, (1985).Google Scholar
  9. 9.
    V.D. Scott and G. Love, “Quantitative Electron-Probe Microanalysis,” John Wiley & Sons, New York, 1983.Google Scholar
  10. 10.
    J.M. Rebstock and T.B. Vander Wood, Automated analysis of cleanroom particulate contaminants, paper presented at the American Association for Aerosol Research Annual Meeting, (October, 1988).Google Scholar
  11. 11.
    W.R. Gerristead, Automated microprobe characterization of particles in VLSI gases, paper presented at the American Association for Aerosol Research Annual Meeting, (October, 1988).Google Scholar
  12. 12.
    J.I. Goldstein and A. Yakowitz, eds., “Practical Scanning Electron Microscopy,” Plenum Press, New York, 1975.Google Scholar
  13. 13.
    American Iron and Steel Institute, “AISI Standard Steels,” 1977.Google Scholar
  14. 14.
    D.L. Massart and L. Kaufman, “The Interpretation of Analytical Chemical Data by the Use of Cluster Analysis,” John Wiley & Sons, New York, 1983.Google Scholar

Copyright information

© Springer Science+Business Media New York 1990

Authors and Affiliations

  • T. B. Vander Wood
    • 1
  • L. D. Detter
    • 1
  1. 1.McCrone Associates-AtlantaNorcrossUSA

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