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In-Situ Particle Monitoring in a Plasma Etcher

  • John Gregg
  • Peter G. Borden

Abstract

A particle sensor appropriate for use with plasma etchers used in VLSI processes has been demonstrated. The sensor uses laser light scattering to detect particles, with 0.3 μm diameter being the smallest detectable particle size, and is protected from attack by reactive halogens. Correlation between sensor particle count levels and wafer surface particle counts is demonstrated. Count rates are sufficient to allow use in both process optimization and process control applications. Examples of count rates as a function of process parameters are shown. Both short-term episodic events and long-term trends related to etcher operation are seen during production monitoring.

Keywords

Preventive Maintenance Particle Count Plasma Etcher Particle Level Surface Scanner 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media New York 1990

Authors and Affiliations

  • John Gregg
    • 1
  • Peter G. Borden
    • 1
  1. 1.High Yield Technology, Inc.SunnyvaleUSA

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