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Electron Microscope Methods for Imaging Internal Magnetic Fields at High Spatial Resolution

  • J. C. H. Spence
  • Z. L. Wang
Part of the NATO ASI Series book series (NSSB, volume 259)

Abstract

This Advanced Study Institute is primarily concerned with magnetism in small particles, thin films, interfaces and multilayers. In other words, we are interested in the effects of boundary conditions and low dimensionality on spin systems. Before the dynamic magnetic properties of these structures can be understood, an older and simpler question often remains to be answered - what is the spatial arrangement of the spins at low temperatures on a nanometer scale? How is the three-dimensional vector field modified by the presence of boundaries, defects and interfaces? For bulk materials, we may similarly be interested in the fine details of magnetic domain structure - for example in the measurement of domain wall width, and in the mechanisms of flux pinning.

Keywords

Domain Wall Scan Transmission Electron Microscope Beam Path Internal Magnetic Field Magnetic Domain Structure 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    Jurek, K. & Zaveta, K. JEOL NEWS 26E, 17 (1988).Google Scholar
  2. 2.
    Stearns, D.G., Stearns, M.B., Cheng, Y., Stith, J.H. & Ceglio, N.M. J. Appl. Phys. 67, 2415 (1990).ADSCrossRefGoogle Scholar
  3. 3.
    Chapman, J.N. J. Phys. D 17, 623 (1984).ADSCrossRefGoogle Scholar
  4. 4.
    Jakubovics, J.P. Electron Microscopy in Materials Science 1-pp. 1303 (Commission of the European Communities, Brussels, 1975).Google Scholar
  5. 5.
    Missiroli, G.F., Pozzi, G. & Valdre, U. J. Phys. E: Sci Instr. 14, 649 (1981).ADSCrossRefGoogle Scholar
  6. 6.
    Aharonov, Y. & Bohm, D. Phys. Rev. 115, 485 (1959).MathSciNetADSMATHCrossRefGoogle Scholar
  7. 7.
    Tonomura, A., et al. Phys. Rev. Letts. 48, 1433 (1982).ADSCrossRefGoogle Scholar
  8. 8.
    Tsukahara, S. & Kawakatsu, H. J. Magn. Magn. Mater. 36, 98 (1983).ADSCrossRefGoogle Scholar
  9. 9.
    Cohen, M.S. J. Appl. Phys. 38, 4966 (1967).ADSCrossRefGoogle Scholar
  10. 10.
    Matteucci, G., Missiroli, G.F. & Pozzi, G. IEEE Trans on Magnetics. MAG-20, 1870 (1984).Google Scholar
  11. 11.
    Mollenstedt, G. & Wahl, H. Naturwiss. 55, 340 (1968).ADSCrossRefGoogle Scholar
  12. 12.
    Tonomura, A., et al. Phys. Rev. B 25, 6799 (1982).ADSCrossRefGoogle Scholar
  13. 13.
    Spence, J.C.H. Experimental high resolution electron microscopy. (Oxford University Press, New York, 1988). Second edition.Google Scholar
  14. 14.
    Tonomura, A., Matsuda, T., Endo, J., Arii, T. & Mihama, K. Phys. Rev. Letts. 44, 1430–1433 (1980).ADSCrossRefGoogle Scholar
  15. 15.
    Osakabe, N., et al. Appl Phys. Letts. 42, 746 (1983).ADSCrossRefGoogle Scholar
  16. 16.
    Frost, B. & Lichte, H. Inst. Phys. Conf. Ser. 93, 267 (“EUREM 88”) (1988).Google Scholar
  17. 17.
    Chapman, J.N., Wadell, E.M., Batson, P. & Ferrier, R.P. Ultramic. 3, 203 (1978).CrossRefGoogle Scholar
  18. 18.
    Dekkers, N.H. & de Lang, H. Philips Tech. Rev. 37, 1 (1977).Google Scholar
  19. 19.
    Morrison, G.R. & Chapman, J.N. Optik 64, 1 (1983).Google Scholar
  20. 20.
    McFadyen, I.R. Personal communication. (1990).Google Scholar
  21. 21.
    McFayden, I.R. Proc. 47 th Electr. Micros. Soc. Am.(G. Bailey, Ed.) San Francisco Press. 568 (1989).Google Scholar
  22. See also J. Appl. Phys. 64, p.6011 (1988) for details of the use of DPC on a conventional TEM.Google Scholar
  23. 22.
    Chapman, J., Morrison, G.R., Jakuboviks, J.P. & Taylor, R.A. J. Magn. and Mag. Mat. 49, 215 (1985).CrossRefGoogle Scholar
  24. 23.
    Chapman & J.N. J. Phys. D 17, 623 (1983).Google Scholar
  25. 24.
    Gardiner, T.M. Thin Solid Films 105, 213 (1983).ADSCrossRefGoogle Scholar
  26. 25.
    Wang, Z.L., Liu, J., Lu, P. & Cowley, J.M. Ultramicros. 27, 101 (1989).CrossRefGoogle Scholar
  27. 26.
    Tanishiro, Y., Takayanagi, K. & Yagi, K. J. Micros. 142, 211 (1986).CrossRefGoogle Scholar
  28. 27.
    Drucker, J.S., Krishnamurthy, M., Hembree, G., Hong, L. & Venables, J. Proc. 47 th Electr. Micros. Soc. Am. (G. Bailey, Ed.) San Francisco Press, p.208 (1989).Google Scholar
  29. 28.
    Wang, Z.L. & Spence, J.C.H. Surface Science, in press, (1990).Google Scholar
  30. 29.
    Cowley, J.M. Diffraction Physics (North-Holland, New York), (1981).Google Scholar
  31. 30.
    Peng, L.M. & Cowley, J.M. Acta Cryst. A42, 545 (1986).Google Scholar
  32. 31.
    Prinz, G.A., Rado, G.T. & Krebs, J.J. J. Appl. Phys. 53, 2087 (1982).ADSCrossRefGoogle Scholar
  33. 32.
    Yamamoto, N. & Spence, J.C.H. Thin Solid Films 104, 43 (1983).ADSCrossRefGoogle Scholar
  34. 33.
    Wang, Z.L., Liu, J. & Cowley, J.M. Acta Cryst. A45, 325 (1989).Google Scholar
  35. 34.
    Jakubovics, J.P. Phil Mag B37, 761 (1978).ADSCrossRefGoogle Scholar
  36. 35.
    Chapman, J.N., Morrison, G.R., Jakubovics, J.P. & Taylor, R.A. 68, 197 (1983).Google Scholar

Copyright information

© Springer Science+Business Media New York 1991

Authors and Affiliations

  • J. C. H. Spence
    • 1
  • Z. L. Wang
    • 2
  1. 1.Dept. of PhysicsArizona State UniversityTempeUSA
  2. 2.Oak Ridge National LaboratoryOak RidgeUSA

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