Excimer Laser Assisted Deposition of Cr and B Films

  • M. Georgopoulos
  • G. S. Fu
  • E. Hontzopoulos
  • C. Fotakis
Part of the NATO ASI Series book series (NSSB, volume 198)


Over the last years, laser assisted CVD (LCVD) has become a popular technique for surface treatment purposes of a variety of substrates. Deposition is based on reactions which are induced pyrolytically [1] and/ or photolytically [2,3]. In particular, high power ultraviolet excimer laser induced CVD has been used for the deposition of metals [4] such as Cr, W, Mo [5,6], Al [7], semiconductors [8,9] and insulators [10] on different substates.


Aluminum Alloy Substrate Unheated Substrate Torr Background Large Power denSities Unfocused Laser Beam 
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Copyright information

© Springer Science+Business Media New York 1989

Authors and Affiliations

  • M. Georgopoulos
    • 1
  • G. S. Fu
    • 1
    • 2
  • E. Hontzopoulos
    • 1
    • 3
  • C. Fotakis
    • 1
    • 3
  1. 1.FO.R.T.H.-Research Center of CreteInstitute of Electronic Structure & LaserIraklion, CreteGreece
  2. 2.Hebei UniversityHebeiP.R. China
  3. 3.Department of PhysicsUniversity of CreteIraklion, CreteGreece

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