Abstract
In order to elucidate the mechanisms of gas-surface reactions related to the synthesis of III/V-semiconductors by organometallic chemical vapor deposition (OMCVD), we have recently carried out a series of experiments using the technique of resonance-enhanced multiphoton ionization/mass spectrometry (REMPI/MS) to detect gas phase products under single gassurface collision conditions.1–5 The technique has the inherent optical specificity of laser spectroscopy and mass selectivity of mass spectrometry. Accordingly, for the mass-selected REMPI detection of atomic and free radical species, concentrations at 103–104 particles/cc level can be readily detected.6 Aside from the detection of transient gaseous species by laser ionization, stable products such as CH4 and C2H6 can also be detected in our experiments and their concentrations measured by means of the conventional electron impact ionization/mass spectrometry (EI/MS) with appropriate calibrations.
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References
D.W. Squire, C.S. Dulcey and M.C. Lin, Formation of CH3 Radicals in the Decomposition of Trimethylaluminum on Hot Solid Surfaces, Chem. Phys. Lett. 116: 525 (1985).
D.W. Squire, C.S. Dulcey and M.C. Lin, Mechanistic Studies of the Decomposition of Trimethylaluminum on Heated Surfaces, J. Vac. Sci. Technol. B3: 1513 (1985).
D.W. Squire, C.S. Dulcey and M.C. Lin, Multiphoton Ionization/Mass Spectrometric Detection of Gallium Atom During the Trimethylgallium CVD Reaction, Chem. Phys. Lett. 131: 112 (1986).
D.W. Squire, C.S. Dulcey and M.C. Lin, MPI/MS Studies of Thin Film Deposition Processes: Methyl Production from Trimethylgallium Decomposition and the Effect of Added Hydrazine, Mat. Res. Soc. Symp. Proc. 54: 709 (1986).
D.W. Squire, C.S. Dulcey and M.C. Lin, Surface Reactions of OMCVD: Detection of Gas Phase Radicals in GaAs Deposition Under Single Gas-Phase Collision Conditions, Mat. Res. Soc. Symp. Proc. 101: 301 (1988).
M.C. Lin and W.A Sanders, Detection and Spectroscopy of Methyl and Substituted Methyl Radicals by Resonance Enhanced Multiphoton Ionization, in: “Advances in Multiphoton Processes and Spectroscopy”, S.H. Lin, ed., World Scientific Publishing Co. 1986.
M.C. Lin and G. Ertl, Laser Probing of Molecules Desorbing and Scattering From Solid Surfaces, Ann. Rev. Phys. Chem. 37: 587 (1986).
J.A. Kerr, Strengths of Chemical Bonds, in: “Handbook of Chemistry and Physics,” R.C. Weast, ed., P. F170 (1986-87).
See, for example, G. Bruno and J.B. Honeycutt, The Use of Aluminum Alkyls in Organic Synthesis, and its Subsequent Supplements (Ethyl Corp., Baton Rouge, LA, 1969, 1973 and 1979).
D.K. Gaskill, N. Bottka and M.C. Lin, Growth of GaN Films Using Trimethylgallium and Hydrazine, Appl. Phys. Lett. 48: 1449 (1986).
D.K. Gaskill, N. Bottka and M.C. Lin, OMVPE of GaN and A1N Films by Metalalkyls and Hydrazine, 3. Cryst. Growth, 77: 418 (1986).
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© 1989 Springer Science+Business Media New York
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Lin, M.C. (1989). Multiphoton Ionization/Mass Spectrometric Study of OMCVD Mechanisms Under Single Gas-Surface Collision Conditions. In: Cole-Hamilton, D.J., Williams, J.O. (eds) Mechanisms of Reactions of Organometallic Compounds with Surfaces. NATO ASI Series, vol 198. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-2522-0_22
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DOI: https://doi.org/10.1007/978-1-4899-2522-0_22
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