Abstract
Laser can be used to heat up chemical reactants directly or indirectly to induce chemical reactions for depositing thin films of materials, and such processes are called pyrolytic LCVD. Various aspects of LCVD have been discussed by Bäuerle (1986). In the case of indirect heating of the chemical reactants, the substrate absorbs the laser energy to produce a localized hot spot at its surface, and collisions between the reactant molecules and the hot spot transfer thermal energy to the reactants. Sometimes, the energy radiated by the hot spot can heat up the reactants to induce chemical reactions above the substrate surface. It should be noted that the width of a depositing film can be controlled better during pyrolytic LCVD, if the chemical reactions occur only at the hot spot on the substrate surface. In the case of direct heating, the reactants, which can be in the gas, liquid, or solid phase, are chosen in such a way that the reactant molecules absorb the laser energy to reach an excited state. The intramolecular and intermolecular collisions cause this excitation energy to be redistributed within the translational, rotational, and vibrational modes of the same molecule and among other molecules, respectively, within 10−12 to 10−7. When the temperature of the molecules reaches the reaction threshold temperature, the chemical reactions occur. As the reactants can be raised to a very high temperature in a small volume over a short time by using a laser beam, novel reaction products due to different reaction paths are expected in pyrolytic LCVD processes compared to the reactions induced by conventional heating.
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Mazumder, J., Kar, A. (1995). Pyrolytic LCVD. In: Theory and Application of Laser Chemical Vapor Deposition. Lasers, Photonics, and Electro-Optics. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-1430-9_2
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DOI: https://doi.org/10.1007/978-1-4899-1430-9_2
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