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Diamond Films: Procedures and Parameters

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Microwave Discharges

Part of the book series: NATO ASI Series ((NSSB,volume 302))

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Abstract

The very first synthesis of diamond dates from the 20’s, however reproducible results were not obtained until the 50–60’s, when research on high pressure high temperature processes’ and on the diamond deposition under metastable conditions2,3 had begun. Because of the very low deposition rates, the field of thin film deposition had minimal support in the USA, whereas Dejarguin and Spitsyn in the USSR continued deep research during the 30 last years. A large increase in research in this field date212 s from the 80’s where the rates of deposition reached the 1 ysm/h4. At present, the number of American, Japanese and Europeen conferences on the subject demonstrates the international interest including industry, military and universities5. This increase of interest is due to the very large potential for applications of diamond thin films. Diamond was named “molecule of the year” in 19906. Nowadays, companies such as De Beers, Norton, Diamonex, Crystallume are producing diamond made devices, the microstructure characteristics and the thickness of which depend on the process used and on the desired applications. The market of the diamond thin films has been estimated at several billion US dollars per year for the 2000’s.

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Authors and Affiliations

  1. Laboratoire d’Ingéniérie des Matériaux et des Hautes Pressions, Avenue Jean Baptiste Clément, 93430, Villetaneuse, France

    A. Gicquel, E. Anger & C. Héau

Authors
  1. A. Gicquel
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  2. E. Anger
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  3. C. Héau
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Editors and Affiliations

  1. Instituto Superior Técnico, Centro de Electrodinâmica da Universidade Técnica de Lisboa, Lisbon, Portugal

    Carlos M. Ferreira

  2. Groupe de physique des plasmas, Université de Montréal, Montréal, Québec, Canada

    Michel Moisan

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© 1993 Springer Science+Business Media New York

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Gicquel, A., Anger, E., Héau, C. (1993). Diamond Films: Procedures and Parameters. In: Ferreira, C.M., Moisan, M. (eds) Microwave Discharges. NATO ASI Series, vol 302. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-1130-8_35

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  • DOI: https://doi.org/10.1007/978-1-4899-1130-8_35

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4899-1132-2

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