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Semiconductor Processing Applications of Microwave Plasmas

  • J. Paraszczak
  • J. Heidenreich
Part of the NATO ASI Series book series (NSSB, volume 302)

Abstract

Plasmas with electron densities ranging from 108 to 1012 electrons/cc. are pervasively used in the microelectronics industry for a variety of purposes. These include etching, deposition and surface treatment of materials ranging from insulators such as polymers or inorganic dielectrics to conductors or semiconductors such as metals, silicon, gallium arsenide and other such materials.

Keywords

Etch Rate Diamond Film Plasma System Electron Energy Loss Spectroscopy Microwave Plasma 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media New York 1993

Authors and Affiliations

  • J. Paraszczak
    • 1
  • J. Heidenreich
    • 1
  1. 1.IBM T.J. Watson Research CentreYorktown HeightsUSA

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