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Semiconductor Processing Applications of Microwave Plasmas

  • Chapter
Microwave Discharges

Part of the book series: NATO ASI Series ((NSSB,volume 302))

Abstract

Plasmas with electron densities ranging from 108 to 1012 electrons/cc. are pervasively used in the microelectronics industry for a variety of purposes. These include etching, deposition and surface treatment of materials ranging from insulators such as polymers or inorganic dielectrics to conductors or semiconductors such as metals, silicon, gallium arsenide and other such materials.

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  1. IBM T.J. Watson Research Centre, Yorktown Heights, N.Y., 10598, USA

    J. Paraszczak & J. Heidenreich

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  1. Instituto Superior Técnico, Centro de Electrodinâmica da Universidade Técnica de Lisboa, Lisbon, Portugal

    Carlos M. Ferreira

  2. Groupe de physique des plasmas, Université de Montréal, Montréal, Québec, Canada

    Michel Moisan

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Paraszczak, J., Heidenreich, J. (1993). Semiconductor Processing Applications of Microwave Plasmas. In: Ferreira, C.M., Moisan, M. (eds) Microwave Discharges. NATO ASI Series, vol 302. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-1130-8_28

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