Abstract
It is now well recognized that magnetically assisted high frequency (HF) plasmas exhibit a number of characteristics that are of interest for thin film deposition or for the reproduction of narrow patterning during the fabrication of electronic components. Such plasma reactors are now in use in Japanese factories but there are still open questions concerning pattern profiles, selectivity and rate of processes, uniformity, rate and damage control of the surfaces treated. Clearly, additional research work is required before the long term viability of such machines be definitely proven.
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© 1993 Springer Science+Business Media New York
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Margot, J., Moisan, M. (1993). Modeling of Surface-Wave-Sustained Plasmas in Static Magnetic Fields: A Tool for the Study of Magnetically Assisted HF Plasmas. In: Ferreira, C.M., Moisan, M. (eds) Microwave Discharges. NATO ASI Series, vol 302. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-1130-8_10
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DOI: https://doi.org/10.1007/978-1-4899-1130-8_10
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