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Low Energy Deposition of 111In on Cu(17 1 1) Surfaces

  • C. R. Laurens
  • M. F. Rosu
  • F. Pleiter
  • L. Niesen
Part of the NATO ASI Series book series (NSSB, volume 360)

Abstract

In this paper we give a short introduction to the Perturbed Angular Correlation technique and present a novel deposition method for radioactive atoms that probe their surroundings via the hyperfine interaction. Recently obtained results for In depositions on Cu(17 1 1) with energies varying from 5 to 100 eV are discussed and compared with results obtained by evaporation. The experimental results are also compared with molecular dynamics simulations of the low energy deposition process.

Keywords

Molecular Dynamic Simulation Deposition Energy Electric Field Gradient Probe Atom Step Edge 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

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Copyright information

© Springer Science+Business Media New York 1997

Authors and Affiliations

  • C. R. Laurens
    • 1
  • M. F. Rosu
    • 1
  • F. Pleiter
    • 1
  • L. Niesen
    • 1
  1. 1.Nuclear Solid State Physics, Materials Science CentreGroningen UniversityGroningenThe Netherlands

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