PZT Thin Films by Radio Frequency Magnetron Sputtering
Pb(ZrxT1-x)O3 (or PZT) thin films have been deposited on  LiTaO3 single crystal substrates by radio frequency magnetron sputtering using a ceramic target with excess PbO. Highly oriented  PZT thin films were obtained when the as-deposited thin films were annealed at 650°C for 60 min in an oxygen ambient, and a well-developed grain structure was formed. The optical properties of these thin films were also studied.
KeywordsPulse Laser Deposition Metalorganic Chemical Vapor Deposition Radio Frequency Magnetron Ceramic Target Radio Frequency Magnetron Sputtering
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