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PZT Thin Films by Radio Frequency Magnetron Sputtering

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Book cover Applications of Photonic Technology 2

Abstract

Pb(ZrxT1-x)O3 (or PZT) thin films have been deposited on [110] LiTaO3 single crystal substrates by radio frequency magnetron sputtering using a ceramic target with excess PbO. Highly oriented [101] PZT thin films were obtained when the as-deposited thin films were annealed at 650°C for 60 min in an oxygen ambient, and a well-developed grain structure was formed. The optical properties of these thin films were also studied.

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Author information

Authors and Affiliations

  1. Department of Electronic Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong

    D. X. Lu, E. M. W. Wong, E. Y. B. Pun & P. S. Chung

  2. Department of Chemistry, The Hong Kong University of Science and Technology, Hong Kong

    G. C. Jia

Authors
  1. D. X. Lu
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  2. E. M. W. Wong
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  3. E. Y. B. Pun
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  4. P. S. Chung
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  5. G. C. Jia
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Editor information

Editors and Affiliations

  1. A.U.G. Signals Ltd., Toronto, Ontario, Canada

    George A. Lampropoulos

  2. Université Laval, Quebec City, Quebec, Canada

    Roger A. Lessard

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© 1997 Springer Science+Business Media New York

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Lu, D.X., Wong, E.M.W., Pun, E.Y.B., Chung, P.S., Jia, G.C. (1997). PZT Thin Films by Radio Frequency Magnetron Sputtering. In: Lampropoulos, G.A., Lessard, R.A. (eds) Applications of Photonic Technology 2. Springer, Boston, MA. https://doi.org/10.1007/978-1-4757-9250-8_9

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  • DOI: https://doi.org/10.1007/978-1-4757-9250-8_9

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4757-9252-2

  • Online ISBN: 978-1-4757-9250-8

  • eBook Packages: Springer Book Archive

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