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Influence of Thickness on Orientational Dependence of Critical Current Density of NbTi Thin Films

  • M. Takeda
  • K. Nishigaki
  • H. Toda
Part of the Advances in Cryogenic Engineering book series (ACRE, volume 44)

Abstract

The influence of thickness on the orientational dependence of critical current density J c of NbTi thin films has been studied experimentally. The thickness, d, of the films investigated are 26 mn, 35 nm, 50 nm, and 120 nm. Measurements of J c as a function of the amplitude and orientation of the magnetic field B with respect to the film plane are performed at 4.2 K. It is found that the orientational dependence of J c clearly changes from a simple behavior to a more complex one with increasing the thickness of the films. The ratio of J c for perpendicular and parallel film orientation is empirically seen to increase as d 1/2 . The parallel field dependence of J c is qualitatively described using the theoretical expressions derived by Mawatari and Yamafuji.

Keywords

Critical Current Density High Magnetic Field Multilayer Film Film Plane Theoretical Expression 
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Copyright information

© Springer Science+Business Media New York 1998

Authors and Affiliations

  • M. Takeda
    • 1
  • K. Nishigaki
    • 1
  • H. Toda
    • 2
  1. 1.Kobe University of Mercantile MarineHigashinada-ku, Kobe 658Japan
  2. 2.Koatsu Gas Kogyo Co., Ltd.Kita-ku, Osaka 530Japan

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