Micromachining Using Porous Silicon
Porous silicon was proposed since 1994 for micromachining, but at first only for sacrificial layers [193–198]. Lehmann considered it as new base material for MEMS using the high internal surface of macropores in 1996 . Tjerkstra combined porosification and electropolishing of Si to form free-standing layers of porous Si to separate concentric microchannels  and uses isotropic electropolishing to micromachine buried microchannels . All the devices have in common that they are mechanically static.
KeywordsPorous Silicon Optical Filter Electrochemical Etching Filter Plate Mask Level
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