Abstract
Contamination and etching are terms used quite negatively by the analytical electron microscopist. The mental “images” evoked are of a loss of resolution, a decrease in signal/noise ratio, destruction of the microstructure, etc. Yet more propitious results may be achieved by using our empirical understanding of the phenomena to manufacture microcircuits, measure foil thickness, or to preferentially etch microstructures. For the most part, however, the effects of rapid contamination buildup or the local loss in specimen mass are viewed as worse than annoying. They are, in fact, significant barriers to continued advances in true microchemical and high resolution microstructural analyses. The present chapter attempts to summarize our understanding of the physical processes contributing to each phenomenon, to illustrate their effects on AEM, to describe some working cures (and even a few applications), and to project some avenues for further improvement.
This is a preview of subscription content, log in via an institution.
Buying options
Tax calculation will be finalised at checkout
Purchases are for personal use only
Learn about institutional subscriptionsPreview
Unable to display preview. Download preview PDF.
References
Ambrose, B. K., L. Holland and L. Laurenson, J. Microscopy 96 (1972) 389.
Bauer, B. and R. Speídel, Optik, 48 (1977) 237.
Broers, A. N., Microele. and Reliability, 4 (1963) 103.
Burton, E. F., R. S. Sennett and S. G. Ellis, Nature, 160 (1947) 565.
Calbick, C. J. and R. E. Hartman, Proc. Twenty Seventh Annual EMSA Meeting (1969) 82.
Castaing, R. and J. Descamps, C. R. Acad. Sci.: Paris, 238 (1954) 1506.
Cosslett, V. E., J. Appl. Phys., 18 (1947) 844.
Crewe, A. V. and J. Watt, J. Mol. Biol., 48 (1970) 375. Dubochet, J., J. Ultrastr. Res., 52 (1975) 276.
Egerton, R. F. and C. J. Roussouw, J. Phys. D.: Appl. Phys., 9 (1976) 659.
Ellis, S. G., Paper read to the American Electron Microscopy Society, Washington, D. C., Nov. (1951).
Elsey, R. J., Vacuum, 25 (1975a) 299.
Elsey, R. J., Vacuum, 25 (1975b) 347. Ennos, A. E., Brit. J. Appl. Phys., 4 (1953) 101.
Ennos, A. E., Brit. J. Appl. Phys., 5 (1954) 27.
Fourie, J. T., Optik, 44 (1975) 111.
Fourie, J. T., Proc. Ninth Annual SEM Symposium, IITRI: Chicago (1976a)
Fourie, J. T., Proc. Sixth European Congress on Elec. Micros., Jerusalem, 1 (1976b) 396.
Fourie, J. T., Proc. Ninth Intl. Congress on Elec. Micros., Vol. 1 (1978a) 116.
Fourie, J. T., Optik, 52 (1978b) 91.
Fourie, J. T., Proc. Twelfth Annual SEM Symposium, Washington, D.C. (1979) in press.
Fraser, H., Scanning Electron Microscopy, I (1978) 627.
Geiss, R. H., Proc. Thirty Third EMSA Annual Meeting (1975) 218.
Geiss, R. H. and T. C. Huang, J. Vac. Sci. and Technol., 12 (1975) 140.
Goodman, P. and G. Lempfuhl, Z. Naturforsch, 20a (1965) 110.
Grigson, C. W. B., W. C. Nixon and F. Tothill, Proc. Sixth Intl. Conf. Elec. Micros.: Kyoto, 1 (1966) 157.
Hart, R. K., T. F. Kassner and J. K. Maurin, Proc. Sixth Intl. Conf. Elec. Micros.: Kyoto, 1 (1966) 161.
Valdré, U., Proc. Sixth Intl. Conf. Elec. Micros.: Kyoto, 1 (1966) 155. Hartman, R. E. and R. S. Hartman, Lab. Invest., 14 (1965) 409.
Hartman, R. E., R. S. Hartman and P. L. Ramos, Proc. Twenty Sixth Annual EMSA Meeting (1968) 292.
Hartman, R. E., H. Akahori, C. Garrett, R. S. Hartman, and P. L. Ramos, Proc. Twenth Seventh Annual EMSA Meeting (1969) 82.
Hartman, R. E. and R. S. Hartman, Proc. Twenty Ninth Annual EMSA Meeting (1971) 74.
Heide, H. G., Proc. Fifth Intl. Conf. Elec. Micros.: Philadelphia (1962) A-4.
Heide, H. G., Zeit für Angew. Phys., XV (1963) 117.
Hillier, J. and N. Davidson, J. Appl. Phys., 18 (1947) 499.
Hillier, J., J. Appl. Phys., 19 (1948) 226.
Holland, L., L. Laurenson and M. J. Fulkner, Japan J. Appl. Phys., 12 (1973) 1468.
Hren, J. J., E. J. Jenkins and E. Aigeltinger, Proc. Thirty Fifth Annual Meeting EMSA (1977) 66.
Hren, J., Proc. Workshop on AEM: Cornell (1978) 62; Ultramicroscopy, 3 (1979) 375.
Isaacson, M., J. Langmore and J. Wall, Scanning Elec. Micros., IITRI: Chicago, IL (1974) 19.
Kambe, K. and G. Lehmpfuhl, Optik, 42 (1975) 187.
Kinder, E., Naturwiss., 34 (1947) 23.
König, H., Naturwiss., 35 (1948) 261.
König, H., Zeit. für Phys, 129 (1951) 483.
König, H. and G. Helwig, Zeit. für Phys, 129 (1951) 491.
Eisegang, S., Proc. Intl. Conf. Elec. Micros.: London (1954) 184.
Le Poole, J. B., Developments in Electron Microscopy and Analysis, ed. J. A. Venables, Academic Press (1976) 79.
Mills, J. C. and A. F. Moodie, Rev. Sci. Instru., 39 (1968) 962.
Müller, K. H., Optik, 33 (1971a) 296.
Müller, K. H., Optik, 33 (1971b) 331.
Oatley, C. W., W. C. Nixon and R. F. N. Pease, Adv. Elect. Electron Phys., 21 (1965) 181.
Rackham, G. M., Ph.D. Dissertation, University of Bristol (1975) 39.
Riecke, W. D., Z. Angew. Phys., 27 (1969) 155.
Ruska, E., Kolloid. Z., 100 (1942) 212.
Sauberman, A. J., Proc. Thirty Fifth Annual EMSA Meeting (1977) 366.
Silcox, J., Analytical Electron Microscopy: Report of a Specialist Workshop, July 1978, Cornell University, pp. 62–129.
Smith, K. C. A. and J. R. A. Cleaver, Developments in Electron Microscopy and Analysis, ed. J. A. Venables, Academic Press (1976) 75.
Statham, P. J., J. V. P. Long, G. Waite, and K. Kandiah, X-ray Spectrometry, 3 (1974) 153.
Stewart, R. L., Phys. Rev., 45 (1934) 488.
Sutfin, L. V., Proc. IXCOM, Boston (1977) 66A.
Thomas, J. M. and P. L. Walker, JR., Carbon, 2 (1965) 434.
Thornhill, J. W. and I. M. Mackintosh, Microelec. and Reliability, 4 (1965) 97.
Tomita, T., Y. Harada, H. Watanabe and T. Etoh, Ninth Intl. Congress on EM, Toronto (1978) 1, 114.
Tonomura, A., Optik, 39 (1974) 386.
Valdré, U., Proc. Sixth Intl. Conf. Elec. Micros.: Kyoto, 1 (1966) 157.
Wall, J., J. Bittner and J. Hainfeld, Proc. Thirty Fifth Annual EMSA Meeting (1977) 558.
Watson, J. H. L., J. Appl. Phys., 18 (1947) 153.
Zaluzec, N., Ph.D. Thesis, Univ. of Illinois (1978); Oak Ridge National Laboratory Report ORNL/TM-6705.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1979 Springer Science+Business Media New York
About this chapter
Cite this chapter
Hren, J.J. (1979). Barriers to AEM: Contamination and Etching. In: Hren, J.J., Goldstein, J.I., Joy, D.C. (eds) Introduction to Analytical Electron Microscopy. Springer, Boston, MA. https://doi.org/10.1007/978-1-4757-5581-7_18
Download citation
DOI: https://doi.org/10.1007/978-1-4757-5581-7_18
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4757-5583-1
Online ISBN: 978-1-4757-5581-7
eBook Packages: Springer Book Archive