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X-Ray Scattering from Self-Organized Structures

  • Ullrich Pietsch
  • Václav Holý
  • Tilo Baumbach
Part of the Advanced Texts in Physics book series (ADTP)

Abstract

A promising method for fabricating low-dimensional systems is based on processes of self-organization taking place during epitaxial growth under suitable growth conditions. In contrast to the lithographically based techniques, the self-organization method can pattern large areas of the substrate (even whole substrate wafers) and it is also less time-consuming. The disadvantage of this method lies in its statistical nature. Resulting arrays of nano-objects are not exactly periodic and homogeneous. In this context, x-ray methods as tools for the investigation of the structure quality of the arrays are of extraordinary importance.

Keywords

Quantum Wire Lateral Maximum Step Bunch SiGe Island Monolayer Step 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media New York 2004

Authors and Affiliations

  • Ullrich Pietsch
    • 1
  • Václav Holý
    • 2
  • Tilo Baumbach
    • 3
  1. 1.Institute of PhysicsUniversity of PotsdamPotsdamGermany
  2. 2.Department of Solid State PhysicsMasaryk UniversityBrnoCzech Republic
  3. 3.Institut fuer SynchrotronstrahlungForschungszentrum Karlsruhe in der Helmholtz-GemeinschaftKarlsruheGermany

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