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Hardness of Titanium Carbide Thin Films Deposited on Silicon by Laser Ablation

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Abstract

Hardness of titanium carbide films deposited on silicon (111) substrate by pulsed laser ablation is evaluated in dependence on laser beam fluence and the film thickness. Measurements were performed with the use of a common microhardness testing equipment, the indenter penetartion depth being more than thickness of the coating. Two methods based both on a law-of-mixtures’ approach were employed to calculate the film hardness from the measured hardness of the composite film-substrate system. One of them accounts for the indentation size effect. The hardness is revealed to reduce significantly with an increase of the film thickness and the laser beam fluence.

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De Maria, G., Ferro, D., Barinov, S., Alessio, L.D., Teghil, R. (2002). Hardness of Titanium Carbide Thin Films Deposited on Silicon by Laser Ablation. In: Bradt, R.C., Munz, D., Sakai, M., Shevchenko, V.Y., White, K. (eds) Fracture Mechanics of Ceramics. Springer, Boston, MA. https://doi.org/10.1007/978-1-4757-4019-6_35

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  • DOI: https://doi.org/10.1007/978-1-4757-4019-6_35

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4419-3370-6

  • Online ISBN: 978-1-4757-4019-6

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