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Deposition Kinetics for Polymerization via the Gorham Route

  • Jeffrey B. Fortin
  • Toh-Ming Lu
Chapter

Abstract

It is known to those familiar with parylene that it is has very unique deposition kinetics. The deposition rate increases as the substrate temperature is decreased, which is the opposite of most CVD reactions. The deposition rate increases as the monomer pressure in the chamber is increased, which is more typical of a CVD reaction. It is also known that there is a minimum pressure below which no deposition occurs. This pressure increases (decreases) as substrate temperature increases (decreases). Before more information is presented on parylene kinetic models it is important to have an overview of CVD kinetics in general.

Keywords

Deposition Rate Control Type Initiation Reaction Sticking Coefficient Substrate Temperature Increase 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media New York 2004

Authors and Affiliations

  • Jeffrey B. Fortin
    • 1
    • 2
  • Toh-Ming Lu
    • 3
  1. 1.Department of Engineering ScienceRensselaer Polytechnic InstituteTroyUSA
  2. 2.GE Global Research CenterNiskayunaUSA
  3. 3.Department of PhysicsRensselaer Polytechnic InstituteTroyUSA

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