Scanning Probe Arrays for Lithography
In Chapter 6 we demonstrated dramatic improvements in the writing speed of a single tip, yet patterning throughput is still too low to make SPL a viable large-scale patterning technology. For example, a writing speed of 10 mm/s and a pixel size of 100 nm correspond to a pixel rate of 100 kHz (kilopixels per second). An exposure field measuring 1 cm × 1 cm contains 1010 pixels. If we raster scanned the tip over every pixel in the exposure field, it would take 105 seconds or about one day to cover the region. For comparison, today’s deep ultraviolet (DUV) steppers pattern about 40 200-mm-diameter wafers per hour. Each wafer contains more than 200 1 cm × 1 cm exposure fields.
KeywordsExposure Field Wheatstone Bridge Dimensional Array Input Capacitance Common Mode Rejection Ratio
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