Abstract
In this chapter, SOI CMOS technology is described. Starting from the evolution of SOI technology, various SOI substrate and isolation techniques are introduced. Then, a 0.25μm SOI CMOS fabrication processing sequence is described, followed by major SOI CMOS device structures. In the final portion of this chapter, special-purpose SOI technologies including DRAM, BiCMOS, and power are described.
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Kuo, J.B., Su, KW. (1998). SOI CMOS Technology. In: CMOS VLSI Engineering. Springer, Boston, MA. https://doi.org/10.1007/978-1-4757-2823-1_2
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DOI: https://doi.org/10.1007/978-1-4757-2823-1_2
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