Abstract
High reflectivity multilayers are strongly dependent on the roughness of each interface, which is correlated to the structure of each single layer of the stack. For large values of the period d (d > 40 Å), we generally observe a decrease of the roughness as the stack is increased. In some cases, if the structure of the last additional layer of the stack is good enough, it is possible to smooth the roughness of the previous layer. Using T.E.M. studies of cross-sections of multilayers we have shown some aspects of such phenomena.
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© 1988 Plenum Press, New York
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Vidal, B., Rivoira, R., Philip, R., Lepetre, Y. (1988). Some Characteristics of Multilayers Produced by Magnetron Sputtering Device. In: Dhez, P., Weisbuch, C. (eds) Physics, Fabrication, and Applications of Multilayered Structures. Springer, Boston, MA. https://doi.org/10.1007/978-1-4757-0091-6_31
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DOI: https://doi.org/10.1007/978-1-4757-0091-6_31
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4757-0093-0
Online ISBN: 978-1-4757-0091-6
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