Intensity Oscillations in Reflection High Energy Electron Diffraction during Molecular Beam Epitaxy of Metals on Metals and the Fabrication of Metallic Superlattices
The intensity of the specular reflected RHEED-beam during molecular beam epitaxy of metals (Ni, Cu, Nb, Mo) on W(110) was studied. The preparation was performed under extremely clean conditions, the pressure during growth was below 10-10 mbar. After the first few deposited layers intensity oscillations with a constant period corresponding to one monolayer were visible. For Ni on W(110) polar and azimuth angle dependence of the observed oscillations were examined. Near the Bragg condition there are nearly no oscillations visible; out of phase scattering from terraces with one monolayer difference in height and very flat incidence are the best conditions for obtaining many oscillations.