The Initial Stages of Overlayer Growth Studied Using High Energy Electron Forward Scattering: Cr/Ag(100)
It has recently been shown that both Auger electrons and photoelec-trons with kinetic energies above a few hundred eV are very strongly scattered in a forward direction by overlying atoms [1–3]. Thus there are large electron intensity maxima along the major crystal axes. By monitoring these maxima as a function of overlayer deposition it is possible to determine the growth mechanism of the overlayer without the need for any complex theory. Also, by measuring the shift of these peaks, one can directly measure the elastic strain and relaxation at the interfaces.
KeywordsElastic Strain Growth Mechanism Polar Angle Auger Electron Forward Direction
- 4.D.A. Newstead, C. Norris, C. Binns and P.C. Stephenson: J. Phys. C (in print)Google Scholar