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Low Pressure Organometallic Growth of Chromium-Doped GaAs Buffer Layers

  • M. Bonnet
  • J. P. Duchemin
  • A. M. Huber
  • G. Morillot

Abstract

A strong memory effect takes place during chromium incorporation in low pressure organometallic growth of GaAs layers. SIMS analysis is well adapted to measure the chromium profile in the layer and its incorporation rate in GaAs. The results agree with a two-step adsorption-desorption mechanism on the reactor wall. A decrease of 15% of the Hall mobility for a free carrier concentration of 1017 cm-3, is observed when there is 2×1016 at. cm-3 of chromium in the active layer of a FET structure.

Keywords

Buffer Layer Active Layer Chromium Concentration Hall Mobility Capillary Diameter 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

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Copyright information

© M. Bonnet, J.P. Duchemin, A.M. Huber and G. Morillot 1980

Authors and Affiliations

  • M. Bonnet
    • 1
  • J. P. Duchemin
    • 1
  • A. M. Huber
    • 1
  • G. Morillot
    • 1
  1. 1.Thomson-CSFDomaine de CorbevilleOrsayFrance

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