Low Pressure Microwave Glow Discharge Process for High Deposition Rate Amorphous Silicon Alloy
As glow discharge amorphous silicon alloys become more important for commercial production of photovoltaic, xerographic, optical sensing, and microelectronic devices, economic considerations have motivated considerable research aimed at increasing deposition rate and gas utilization efficiency. Recently, a low pressure microwave glow discharge process was reported (1) which produces good quality a-Si:F:H films, with essentially 100% gas utilization at deposition rates > 100Å/sec.
KeywordsGlow Discharge High Deposition Rate Increase Deposition Rate Deposition Rate Film Plasma Diagnostic Technique
Unable to display preview. Download preview PDF.
- 1.S.J. Hudgens and A.G. Johncock, Proc. MRS Spring Meeting (San Francisco, 1985), to be published.Google Scholar
- 3.F.F. Chen, in Plasma Diagnostic Techniques, edited by R.H. Huddlestone and S.L. Leonard (Academic Press, New York, 1965) Chap. 4.Google Scholar
- 11.S.R. Ovshinsky, Proc. Int’l. Ion Engineering Congress., Kyoto, Japan (1983) 817.Google Scholar