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The Role of Free Radicals in the Formation of Amorphous Thin Films

  • Stanford R. Ovshinsky
Part of the Institute for Amorphous Studies Series book series (IASS)

Abstract

A subject of great scientific and technological interest, amorphous materials is intimately connected with the topic of this meeting. This is especially so since one of the preferred methods of making amorphous films for photovoltaic devices utilizes plasmas in which dissociation of gases is associated with dc electric fields or radio frequency excitation. Such creation of plasmas by nonthermal means generates excited states in the gas, ultimately producing different chemical species from that of the ground state molecules. The excited states have a high energy content and, in some cases, a unique electronic distribution, and are thus much more reactive.

Keywords

Amorphous Material Deep Level Transient Spectroscopy Local Order Dangling Bond Silicon Tetrafluoride 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1991

Authors and Affiliations

  • Stanford R. Ovshinsky
    • 1
  1. 1.Energy Conversion Devices, Inc.TroyUSA

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