Laser Chemical Vapor Deposition (LCVD)
Laser chemical vapor deposition (LCVD) is one of several recently developed deposition techniques using laser sources. The two predominant characteristics of a laser light source—its directionality and its monochromaticity—can both be used to advantage in the deposition of materials. The directionality inherent in a laser source allows energy to be aimed very precisely at an area with dimensions on the order of the wavelength of the particular laser, causing localized deposition. The monochromaticity can be used to deposit energy directly into reacting molecules by exciting either electronic or vibrational energy levels in the reacting species. This precise control of energy flow in the system allows the deposition to occur at substrate temperatures much below those required for thermal equilibrium.
KeywordsSubstrate Temperature Deposition Rate Irradiation Time Scanning Electron Microscopy Photograph Thickness Profile
Unable to display preview. Download preview PDF.
- 2.S. D. Allen and A. B. Trigubo, J. Appl. Phys. (Feb. 1983).Google Scholar
- 3.S. D. Allen and A. B. Trigubo, unpublished results.Google Scholar
- 4.Y. Rytz-Froidevaux, R. P. Salathe, and H. H. Gilgen, Phys. Lett., 84A, 216 (1981).Google Scholar
- D. J. Ehrlich, R. M. Osgood, Jr., and T. F. Deutsch, IEEE J. Quant. QE- 16, 1233 (1980) and references therein.Google Scholar
- 13.J. G. Berg, P. Yeung, and S. D. Allen, TRW, El Segundo, CA, unpublished results.Google Scholar
- 16.See also Proceedings of the MRS Symposium on Laser Diagnostics and Photochemical Processing for Semiconductor Devices (11–82), North Holland, NY.Google Scholar
- 21.P. D. Dapkus, private communication.Google Scholar
- 22.J. F. Ready, Effects of High-Power Laser Radiation, Academic Press, NY, 1971.Google Scholar
- 23.S. D. Allen and J. Goldstone, to be published.Google Scholar
- 24.C. F. Powell, J. H. Oxley, and J. M. Blocher, Jr., Vapor Deposition, Wiley, NY, 1968.Google Scholar