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Laser Chemical Vapor Deposition (LCVD)

  • Susan D. Allen
Part of the Materials Science Research book series (MSR, volume 17)

Abstract

Laser chemical vapor deposition (LCVD) is one of several recently developed deposition techniques using laser sources. The two predominant characteristics of a laser light source—its directionality and its monochromaticity—can both be used to advantage in the deposition of materials. The directionality inherent in a laser source allows energy to be aimed very precisely at an area with dimensions on the order of the wavelength of the particular laser, causing localized deposition. The monochromaticity can be used to deposit energy directly into reacting molecules by exciting either electronic or vibrational energy levels in the reacting species. This precise control of energy flow in the system allows the deposition to occur at substrate temperatures much below those required for thermal equilibrium.

Keywords

Substrate Temperature Deposition Rate Irradiation Time Scanning Electron Microscopy Photograph Thickness Profile 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1984

Authors and Affiliations

  • Susan D. Allen
    • 1
  1. 1.Center for Laser StudiesUniversity of Southern CaliforniaLos AngelesUSA

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