Abstract
Laser chemical vapor deposition (LCVD) is one of several recently developed deposition techniques using laser sources. The two predominant characteristics of a laser light source—its directionality and its monochromaticity—can both be used to advantage in the deposition of materials. The directionality inherent in a laser source allows energy to be aimed very precisely at an area with dimensions on the order of the wavelength of the particular laser, causing localized deposition. The monochromaticity can be used to deposit energy directly into reacting molecules by exciting either electronic or vibrational energy levels in the reacting species. This precise control of energy flow in the system allows the deposition to occur at substrate temperatures much below those required for thermal equilibrium.
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© 1984 Plenum Press, New York
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Allen, S.D. (1984). Laser Chemical Vapor Deposition (LCVD). In: Davis, R.F., Palmour, H., Porter, R.L. (eds) Emergent Process Methods for High-Technology Ceramics. Materials Science Research, vol 17. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-8205-8_30
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DOI: https://doi.org/10.1007/978-1-4684-8205-8_30
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