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The Application of Thermodynamic Calculations to Chemical Vapor Deposition Processes

  • Angus I. Kingon
  • Robert F. Davis
Part of the Materials Science Research book series (MSR, volume 17)

Abstract

Computer codes may be used to calculate CVD phase diagrams. These predict the condensed phases deposited as a function of the thermodynamic conditions, and are particularly important in complex systems, such as the Si-C-H-Cl system. The phase diagrams, combined with the calculated compositions of the gas phase, allow an understanding of the process. The applications and the limitations of these calculations are discussed.

Keywords

Condensed Phase System Pressure Thermodynamic Calculation Chemical Vapor Deposition Process Chemical Vapor Deposition Technique 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1984

Authors and Affiliations

  • Angus I. Kingon
    • 1
  • Robert F. Davis
    • 2
  1. 1.National Physical Research LaboratoryCSIRPretoriaSouth Africa
  2. 2.Department of Materials EngineeringNorth Carolina State UniversityUSA

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