Skip to main content
SpringerLink
Log in
Book cover

Emergent Process Methods for High-Technology Ceramics pp 299–316Cite as

Chemical Vapor Deposition of Ceramic Materials

  • Chapter

Part of the book series: Materials Science Research ((MSR,volume 17))

Abstract

The chemical vapor deposition (CVD) of ceramic materials such as pyrolytic carbon, silicon carbide, boron nitride, and silicon nitride is finding increased application. Factors involved in the control of uniformity and morphology of vapor-deposited structures, as well as the use of plasma and laser technology in extending the scope of CVD, are discussed.

This is a preview of subscription content, log in via an institution.

Chapter
USD   29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD   84.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD   109.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Learn about institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. S. D. Allen, J. Appl. Phys., 52 [11], 6501 (1981).

    Article  CAS  Google Scholar 

  2. R. S. Berg and D. M. Mattox, Proceedings of the Fourth International Conference on Chemical Vapor Deposition, 1973, The Electrochemical Society, Inc., Pennington, NJ.

    Google Scholar 

  3. J. Mazumder and S. D. Allen, Proceedings of the SPIE, 198, 73 (1979), San Diego, CA.

    Google Scholar 

  4. G. Leyendecker, D. Bauerle, P. Geittner, and H. Lydtin, Appl. Phys. Lett., 39 [11], 921 (1981).

    Article  CAS  Google Scholar 

  5. C. P. Christensen and K. M. Lakin, Appl. Phys. Lett., 32 [4], 256 (1978).

    Google Scholar 

  6. W. M. Steen, International Conference on Advances in Surface Coating Techniques, London, 1978.

    Google Scholar 

  7. V. Baranauskas and C. I. Z. Mammana, Appl. Phys. Lett., 36 [11], 930 (1980).

    Article  CAS  Google Scholar 

  8. O. Tabata et al., Proceedings of the Eighth International Conference on Chemical Vapor Deposition, 1981, The Electrochemical Society, Inc., Pennington, NJ.

    Google Scholar 

  9. R. Bilenchi and M. Musei, Proceedings of the Eighth International Conference on Chemical Vapor Deposition, 1981, The Electrochemical Society, Inc., Pennington, NJ.

    Google Scholar 

  10. T. F. Deutsh, D. J. Ehrlich, and R. M. Osgood, Appl. Phys. Lett., 35 [2], 175 (1979).

    Article  Google Scholar 

  11. D. J. Ehrlich, R. M. Osgood, and T. F. Deutsch, Appl. Phys. Lett., 38 [11], 946 (1981).

    Article  CAS  Google Scholar 

  12. D. J. Ehrlich and R. M. Osgood, Thin Solid Films, 90, 287(1982).

    Article  CAS  Google Scholar 

  13. W. R. Cannon et al., Proceedings of the SPIE, 198, 65 (1979).

    Google Scholar 

  14. W. R. Cannon and J. S. Haggerty, Laser Induced Chemical Processes, edited by J. I. Steinfield, Plenum Press, New York, NY (1981).

    Google Scholar 

  15. J. S. Haggerty and W. R. Cannon, Energy Laboratory Report, MIT-EL, 81–003 (1980).

    Google Scholar 

  16. P. K. Boyer, G. A. Roche, W. H. Ritchie, and G. J. Collins, Appl. Phys. Lett., 40 [8], 716 (1982).

    Article  CAS  Google Scholar 

  17. R. W. Andreatta et al., Appl. Phys. Lett., 40 [2], 183 (1982).

    Article  CAS  Google Scholar 

  18. M. Hanabusu, A. Namiki, and K. Yoshihara, Appl. Phys. Lett., 35 [8], 626 (1979).

    Article  Google Scholar 

  19. R. Solanki et al., Appl. Phys. Lett., 38 [7], 572 (1981).

    Article  CAS  Google Scholar 

  20. C. W. Draper, Metallurgical Trans. A., 11A, 349 (1980).

    Article  CAS  Google Scholar 

  21. A. M. Ronn, Chem. Phys. Lett., 42 [2], 202 (1976).

    Article  CAS  Google Scholar 

  22. C. H. J. Van den Brekel et al., Proceedings of the Eighth International Conference on Chemical Vapor Deposition, 1981, The Electrochemical Society Inc., Pennington, NJ.

    Google Scholar 

  23. W. H. Smith and D. H. Leeds, Modern Materials, 7, 139–218 (1970).

    CAS  Google Scholar 

  24. W. R. Holman and F. J. Huegel, Proceedings of the Conference onChemical Vapor Deposition of Refractory Metals, Alloys, and Compounds, 1967, The American Nuclear Society, Hinsdale, IL.

    Google Scholar 

  25. W. J. Wilson, M. F. Browning, V. M. Secrest, and J. M. Blocher, Jr., USAEC Report BMI-1718 (1965).

    Google Scholar 

  26. J. R. Hollahan and A. T. Bell, Techniques and Applications of Plasma Chemistry (1974).

    Google Scholar 

  27. A. T. Bell, Proceedings of the Eighth International Conference on Chemical Vapor Deposition, 1981, The Electrochemical Society, Pennington, NJ.

    Google Scholar 

  28. D. Kuppers, Proceedings of the Seventh International Conference on Chemical Vapor Deposition, 1979, The Electrochemical Society, Pennington, NJ.

    Google Scholar 

  29. K. R. Sarma et al., Proceedings of the Seventh International Conference on Chemical Vapor Deposition, 1979, The Electrochemical Society, Pennington, NJ.

    Google Scholar 

  30. J. R. Hollahan et al., Proceedings of the Sixth International Conference on Chemical Vapor Deposition, 1977, The Electrochemical Society, Pennington, NJ.

    Google Scholar 

  31. B. Bourbon et al., Proceedings of the Sixth International Conference on Chemical Vapor Deposition, 1977, The Electrochemical Society, Pennington, NJ.

    Google Scholar 

  32. K. Wahawili and F. J. Weinberg, AIChe Symposium Series 186, 75, 11 (1979).

    Google Scholar 

  33. D. E. Carlson, J. Electrochem. Soc. Solid State Science & Tech., 122 [10], 1334 (1975).

    CAS  Google Scholar 

  34. A. K. Sinha et al., J. Electrochem. Soc., Solid State Science & Tech., 224 [4], 601 (1978).

    Google Scholar 

  35. S. B. Hyder and T. O. Yep, J. Electrochem. Soc. Solid State Science & Tech., 123 [11], 1721 (1976).

    CAS  Google Scholar 

  36. D. R. Secrist and J. D. Mackenzie, J. Electrochem. Soc., 113 [9], 914 (1966).

    Article  CAS  Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Battelle’s Columbus Laboratories, 505 King Avenue, 43201, Columbus, Ohio, USA

    John M. Blocher Jr., Melvin F. Browning & David M. Barrett

Authors
  1. John M. Blocher Jr.
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Melvin F. Browning
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. David M. Barrett
    View author publications

    You can also search for this author in PubMed Google Scholar

Editor information

Editors and Affiliations

  1. School of Engineering, North Carolina State University, Raleigh, North Carolina, USA

    Robert F. Davis , Hayne Palmour III  & Richard L. Porter ,  & 

Rights and permissions

Reprints and permissions

Copyright information

© 1984 Plenum Press, New York

About this chapter

Cite this chapter

Blocher, J.M., Browning, M.F., Barrett, D.M. (1984). Chemical Vapor Deposition of Ceramic Materials. In: Davis, R.F., Palmour, H., Porter, R.L. (eds) Emergent Process Methods for High-Technology Ceramics. Materials Science Research, vol 17. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-8205-8_23

Download citation

  • DOI: https://doi.org/10.1007/978-1-4684-8205-8_23

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-8207-2

  • Online ISBN: 978-1-4684-8205-8

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics

Search

Navigation