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Monte Carlo Simulations of Deposition Processes

  • J. C. Moreno-Marín
Part of the Nato ASI Series book series (NSSB, volume 271)

Abstract

Under ordinary thin-film deposition conditions, where atoms arrive at the substrate with thermal energies, and at a substrate temperature where the atom mobility is restricted, the film may develop an inhomogeneous and porous structure. If additional energy is provided to the growing film, either directly by the depositing atoms or through simultaneous bombardment with energetic ions, the (crystal) structure is substantially modified, and becomes more dense.

Keywords

Vapor Atom Collision Cascade Occupancy Ratio Spike Volume Vacancy Migration Energy 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1991

Authors and Affiliations

  • J. C. Moreno-Marín
    • 1
  1. 1.Dept. Física AplicadaUniversitat d’AlacantAlacantSpain

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