Low Temperature Metal-Organic Chemical Vapor Deposition (LTMOCVD) Route to the Fabrication of Thin Films of High Temperature Oxide Superconductors
Although the recent discovery of high Tc superconductivity in bulk oxide ceramic samples has excited the scientific community, the technological potential of this new class of superconductors, especially in device-oriented applications, will not be fully realized until a relatively straightforward and easily reproducible technique can be applied to the synthesis of high quality superconducting thin films.1, 2 There has been considerable progress in the fabrication of superconductor thin films using a variety of techniques, e.g., reactive ion beam deposition, cosputtering from separate sources, dc and rf magnetron sputtering from a single source, sequential evaporation, plasma-assisted laser beam deposition, and chemical vapor deposition.3-8 In the present paper, we report on the successful preparation of thin films of the Y-Ba-Cu-O system, showing a sharp transition at 90K, by a novel metal-organic chemical vapor method, followed by in-situ post-deposition annealing. This method has the advantages of relative simplicity and controllability, good film adherence, high film uniformity over a large area and reduced susceptibility to interfacial mixing and cross-contamination. In addition, it produces superconductor films on substrates of complex shape and with high growth rates. Because deposition can be achieved at temperatures as low as 300 °C, the method is called LTMOCVD.
KeywordsAuger Electron Spectroscopy Primary Electron Beam Film Versus Superconductor Thin Film Auger Electron Spectroscopy Depth Profile
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