Negative-Ion Sputtering of Tungsten Bombarded with Alkali Metal Ions
Analysis of the conditions governing earlier experiments on cathodic sputtering indicates that, even under the best vacuum conditions attainable, the desired purity of cold-irradiated surfaces is never achieved in the course of cathodic sputtering, owing to the occurrence of adsorption as well as the penetration of the primary ions. Hence some of the power of the ion beam is used up in ejecting contaminant atoms introduced both by the prinary-ion beam itself and also by the adsorption of residual gases from the main volume of the apparatus. A mass-spectrometric study of the composition of the sputtered particles [1–3] reveals molecular ions corresponding to chemical compounds formed by the target atoms with adsorbed gases. Using a radio-isotope method, we showed earlier  that the sputtering of tungsten in the form of negative ions might constitute a substantial proportion of the total sputtering. The mechanism underlying the sputtering of target material in the form of chemical compounds should clearly differ from that underlying its sputtering from the lattice of the pure material.
KeywordsSecondary Emission Accommodation Coefficient Alkali Metal Atom Tungsten Atom Main Volume
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